Wada Hideo | Technical Research And Development Institute Japan Defense Agency
スポンサーリンク
概要
関連著者
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Wada Hideo
Japan Defense Agency
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Wada Hideo
Technical Research And Development Institute Japan Defense Agency
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Wada H
Japan Defense Agency
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MORIMOTO Jun
Department of Materials Science and Engineering, National Defense Academy
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Morimoto Jun
Department Of Applied Physics National Defense Academy
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Morimoto J
Department Of Materials Science And Engineering National Defense Academy
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HATTORI Kiyoshi
ULSI Research Labs., R&D Center, Toshiba Corporation
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Hattori K
Department Of Materials Science And Chemical Engineering Faculty Of Engineering Shizuoka University
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Hattori K
Graduate School Of Materials Science Nara Institute Of Science And Technology
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Hattori Kiyoshi
ULSI Research Center, Toshiba Corporation, 1, Komukai Toshiba-cho, Saiwai-ku, Kawasaki 210
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Hayashi K
Kyoto Univ. Kyoto Jpn
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Hayashi Kouichi
Department Of Materials Science And Engineering Kyoto University
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HAYASHI Ken-ichi
Keio University
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OHTA Eiji
Keio University
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YOSHINO Junya
Department of Materials Science and Engineering, National Defense Academy
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Yoshino J
National Defense Acad. Kanagawa Jpn
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Yoshino Junya
Department Of Computational Science And Engineering Graduate School Of Engineering Nagoya University
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SUNAOSHI Hitoshi
ULSI Research Labs., R&D Center, Toshiba Corporation
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Hayashi Kunihiko
Superconductivity Research Laboratory International Superconductivity Technology Center
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Ohta E
Keio University
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Hayashi Katsuro
Frontier Collaborative Research Center Tokyo Institute Of Technology
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Sunaoshi Hitoshi
Ulsi Research Laboratories Research And Development Center Toshiba Corporation
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ANDO Akira
National Institute for Fusion Science
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AKITSU Tetsuya
Interdisciplinary Graduate School of Medicine and Engineering, University of Yamanashi
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MATSUZAWA Hidenori
Faculty of Engineering, Yarnanashi University
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HAYASHI Ken-ichi
Department of Electrical and Computer Engineering, Faculty of Engineering, Kanazwa University
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Ando Akira
Murata Mfg. Co. Ltd.
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Akitsu T
Yamanashi Univ.
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Akitsu Tetsuya
Faculty Of Engineering Yamanashi University
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Akitsu Tetsuya
Interdisciplinary Graduate School Of Medicine And Engineering University Of Yamanashi
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Mimotogi S
Department Of Pure And Applied Sciences College Of Arts And Sciences University Of Tokyo
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OHTA Eiji
Department of Material Science, Faculty of Science and Technology, Keio University
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WADA Hideo
Second Research Center, Techaical Research and Development Institute, Japan Defense Agency
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Okamoto Kenji
Faculty Of Engineering Yamanashi University
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Hashimoto S
Texas Instruments Tsukuba R & D Center Ltd. Ibaraki Jpn
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TAKIGAWA Tadahiro
ULSI research Center, Toshiba Corp.
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MAGOSHI Shunko
ULSI Process Engineering Laboratory, Microelectronics Engineering Laboratory, TOSHIBA Corporation
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ANDO Atsushi
ULSI Process Engineering Laboratory, Microelectronics Engineering Laboratory, TOSHIBA Corporation
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Matsuzawa Hidenori
Faculty Of Engineering Yamanashi University
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Wada Hideo
Second Research Center Technical Research And Development Institute Japan Defense Agency
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Ohta Eiji
Department Of Agricultural Chemistry Faculty Of Agriculture Kyoto University
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Ando A
Murata Mfg. Co. Ltd.
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Magoshi S
Ulsi Process Engineering Laboratory Microelectronics Engineering Laboratory Toshiba Corporation
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WADA Hirotsugu
ULSI Research Laboratories, Toshiba Corporation
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HOUSAI Hiroaki
Manufacturing Engineering Research Center, Toshiba Corporation
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HASHIMOTO Susumu
Manufacturing Engineering Research Center, Toshiba Corporation
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Housai Hiroaki
Manufacturing Engineering Research Center Toshiba Corporation
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Hayashi Ken-ichi
Department Of Applied Aquabiology National Fisheries University
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OSADA Tomoaki
Faculty of Engineering, Yamanashi University
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ISHIBASHI Yoshiharu
Faculty of Engineering, Yamanashi University
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IRIKURA Kazunori
Faculty of Engineering, Yamanashi University
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MOCHIZUKI Akihide
Faculty of Engineering, Yamanashi University
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Osada Tomoaki
Faculty Of Engineering Yamanashi University
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Wada Haruyoshi
Faculty Of Engineering Yamanashi University
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Shimomura N
Ebm Engineering And Manufacturing Department Semiconductor Equipment Division Toshiba Machine Co. Lt
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Yoshikawa Ryoichi
Ulsi Research Laboratories Toshiba Corporation
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Matsuzawa H
Chiba Inst. Technol. Narashino
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Mochizuki A
Division Of Electronic And Information Engineering Of The Graduate School Of Technology Tokyo Univer
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Takigawa T
Semiconductor Components Operations Dai Nippon Printing Co. Ltd.
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Irikura Kazunori
Faculty Of Engineering Yamanashi University
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Takigawa Tadahiro
Ulsi Research Center Toshiba Corp
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Mochizuki Akihide
Faculty Of Engineering Yamanashi University
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Wada Hideo
Second Department Of Internal Medicine Mie University School Of Medicine
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Okamoto Kenji
Faculty Of Engineering Science Osaka University
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Mochizuki A
Division Of Electronic And Information Engineering Of The Graduate School Of Technology Tokyo University Of Agriculture And Technology
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Yoshikawa Ryoichi
Ulsi Research Center Toshiba Corporation
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Wada Hirotsugu
ULSI Research Center, Toshiba Corporation, 1, Komukai Toshiba-cho, Saiwai-ku, Kawasaki 210
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WADA HIDEO
Department of Pediatrics, School of Medicine, Faculty of Medicine, Kanazawa University
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KANASHIMA Takeshi
Graduate School of Engineering Science, Osaka University
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SATO Shinji
Niigata College of Pharmacy
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Eriguchi K
Matsushita Electric Industrial Co. Ltd. Osaka Jpn
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Eriguchi Koji
Ulsi Process Technology Development Center Matsushita Electronics
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Fujimoto Akira
Department Of Electrical Engineering Wakayama National College Of Technology
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Fujimoto A
Wakayama National Coll. Technol. Wakayama Jpn
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Sato S
Ulsi Process Engineering Laboratory Microelectronics Engineering Laboratory Toshiba Corporation
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YOSHIKAWA Ryoichi
ULSI research Center, Toshiba Corp.
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YAMAGUCHI Toshio
ULSI Research Center, Toshiba Corporation
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SATO Shinji
ULSI Process Engineering Laboratory, Microelectronics Engineering Laboratory, TOSHIBA Corporation
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MIYAKAWA Toru
Department of Materials Science and Engineering, The National Defense Academy
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MIYAKAWA Toru
Dept. of Materials Science and Engineering, National Defense Academy
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Sato Shinji
Ulsi Process Engineering Laboratory Microelectronics Engineering Laboratory Toshiba Corporation
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Kanashima Takeshi
Graduate School Of Engineering Science Osaka University
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Kanashima Takeshi
Department Of Electrical Engineering Faculty Of Engineering Science Osaka University
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Kanashima Takeshi
Division Of Advanced Electronics And Optical Science Department Of System Innovation Graduate School
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Miyakawa T
Dept. Of Materials Science And Engineering National Defense Academy
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Sato S
Pharmaceutical Research Laboratories Ajinomoto Co. Inc.
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Yamaguchi T
Toshiba Corp. Yokohama Jpn
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Miyakawa Toru
Department Of Applied Physics The National Defense Academy
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Agata Masashi
Area Of Materials And Device Physics Department Of Physical Science Graduate School Of Engineering S
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FUJIMOTO Akira
Dept. Electrical Engineering, Wakayama National College of Technology
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Fujimoto A
Department Of Electrical Engineering Wakayama National College Of Technology
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NISHIMURA Shinsuke
Manufacturing Engineering Research Center, Toshiba Corporation
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WADA Haruhisa
Faculty of Engineering, Yamanashi University
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Wada Haruhisa
Faculty Of Engineering Yamanashi University
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Higuma H
Electronic Ceramics Group Meted And Ceramics Technology Department Advance Technology Research And D
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Okuyama M
Graduate School Of Engineering Science Osaka University
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Maida Osamu
Department Of Physical Science Graduate School Of Engineering Science Osaka University
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Kanashima Takeshi
Area Of Materials And Device Physics Department Of Physical Science Graduate School Of Engineering S
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Wada Hideo
Department Of Internal Medicine Mie University School Of Medicine
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Eriguchi Koji
ULSI Process Tech. Dev. Ctr., Matsushita Electronics
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Wada Hideo
Department of Electronic Chemistry, Tokyo Institute of Technology at Nagatsuta
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Sato Koji
Department of Cancer Biology and Molecular Immunology, Graduate School of Pharmaceutical Sciences, T
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OKUYAMA Masanori
Department of Electrical Engineering, Facully of Engineering Science, Osaka University
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Sato K
Depertment Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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Sato K
National Institute For Fusion Science
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Wada Hideo
Department Of Molecular And Laboratory Medicine Mie University Graduate School Of Medicine
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HIGUMA Hiroko
Electronic Ceramics Group, Meted and Ceramics Technology Department, Advance Technology Research and
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MIYASHITA Shoji
Electronic Ceramics Group, Meted and Ceramics Technology Department, Advance Technology Research and
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HIGUMA Hiroko
Superconducting Materials Group, Metal and Ceramics Technology Department, Advance Technology Resear
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OKAMOTO Yoichi
Department of Materials Science and Engineering, National Defense Academy
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KANASHIMA Takeshi
Department of Physical Science, Graduate School of Engineering Science, Osaka University
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Sato Kuninori
Institute For Fusion Science
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KANASHIMA Takeshi
Area of Materials and Device Physics, Department of Physical Science, Graduate School of Engineering
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MAIDA Osamu
Area of Materials and Device Physics, Department of Physical Science, Graduate School of Engineering
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AGATA Masashi
Area of Materials and Device Physics, Department of Physical Science, Graduate School of Engineering
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OKUYAMA Masanori
Area of Materials and Device Physics, Department of Physical Science, Graduate School of Engineering
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MAIDA Osamu
Department of Physical Science, Graduate School of Engineering Science, Osaka University
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Okuyama Masanori
Department Of Electrical Engineering Faculty Of Engineering Schience Osaka University
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Okuyama Masanori
Area Of Materials And Device Physics Department Of Physical Science Graduate School Of Engineering S
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Sato K
Faculty Of Technology Tokyo Universily Of Agriculture And Technology
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SUGIHARA Kazuyoshi
ULSI Process Engineering Laboratory, Microelectronics Engineering Laboratory, TOSHIBA Corporation
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TAKAMATSU Jun
ULSI Research Labs., R&D Center, Toshiba Corporation
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Yamaguchi Taichi
Superconductivity Research Dept. Material Research Lab. Fujikura Ltd. :(present Address)quality Assu
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Kanashima Takeshi
Area Of Materials And Device Physics Department Of Physical Science Graduate School Of Engineering S
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Sato K
Dept. Of Energy Engineering And Science Nagoya University
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Sugihara Kohei
Process & Manufacturing Engineering Center Semiconductor Company Toshiba Corp.
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SUNO Katsuhiko
Department of Materials Science and Engineering, National Defense Academy
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WADA Hideo
2nd Research Center of Technical Research and Development Institute, Japan Defense Agency
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Ogawa Yoji
Ulsi Research Laboratories Research And Development Center Toshiba Corporation
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Ogawa Yoji
Ulsi Research Center Toshiba Corporation
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Maida Osamu
Area Of Materials And Device Physics Department Of Physical Science Graduate School Of Engineering S
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Suno Katsuhiko
Department Of Materials Science And Engineering National Defense Academy
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Shiozawa K
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Ikenaga Osamu
Ulsi Research Center Toshiba Corporation
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Mikami Shinji
Ulsi Research Laboratories Toshiba Corporation
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Okamoto Yoichi
Department Of Applied Physics National Defense Academy
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AGATA Masashi
Department of Physical Science, Graduate School of Engineering Science, Osaka University
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WADA Hideo
Area of Materials and Device Physics, Department of Physical Science, Graduate School of Engineering
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SUENAGA Machiko
ULSI Research Laboratories, Toshiba Corporation
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YOSHIKAWA Ryouichi
ULSI Research Laboratories, Toshiba Corporation
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WADA Hirotsugu
LSI Research Laboratories, Toshiba Corporation
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Suenaga Machiko
Ulsi Research Laboratories Toshiba Corporation
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Yamasaki S
Ulsi Device Development Laboratories Nec Corporation
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NISHIMURA Shinsuke
EBM Engineering and Manufacturing Department, Semiconductor Equipment Division, Toshiba Machine Co.,
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YAMASAKI Satoshi
EBM Engineering and Manufacturing Department, Semiconductor Equipment Division, Toshiba Machine Co.,
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TAMAMUSHI Shuichi
EBM Engineering and Manufacturing Department, Semiconductor Equipment Division, Toshiba Machine Co.,
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YOSHIOKA Hideyuki
Department of Geriatric Medicine, Faculty of Medicine, Kyoto University
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Yoshioka Hideyuki
Department Of Applied Physics The National Defense Academy
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WADA Haruyoshi
Faculty of Engineering, Yamanashi University
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Takamatsu Jun
Advanced Semiconductor Devices Research Labs. R&d Center Toshiba Corporation
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Miyashita Shoji
Electronic Ceramics Group Meted And Ceramics Technology Department Advance Technology Research And D
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WADA Hitotsugu
ULSI Research Center, Toshiba Corporation
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TAMAMUSHI Syuichi
ULSI Research Center, Toshiba Corporation
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NISHIMURA Eiji
ULSI Research Center, Toshiba Corporation
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IKEDA Naotaka
ULSI Research Center, Toshiba Corporation
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KATOH Yoshihide
ULSI Research Center, Toshiba Corporation
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KUSAKABE Hideo
ULSI Research Center, Toshiba Corporation
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Nishimura Eiji
Ulsi Research Center Toshiba Corporation
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Sugihara Kazuyoshi
Process & Manufacturing Engineering Center Semiconductor Company Toshiba Corp.
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Agata Masashi
Department Of Physical Science Graduate School Of Engineering Science Osaka University
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Tamamushi Syuichi
Ulsi Research Center Toshiba Corporation
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Tamamushi Shuichi
Ebm Engineering And Manufacturing Department Semiconductor Equipment Division Toshiba Machine Co. Lt
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Mori Jun
Department Of Pediatrics Kyoto Prefectural University Of Medicine
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Ohta Eiji
Keio Univ.
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Ikeda Naotaka
Ulsi Research Center Toshiba Corporation
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Katoh Yoshihide
Ulsi Research Center Toshiba Corporation
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Kusakabe Hideo
Ulsi Research Center Toshiba Corporation
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Sato Koji
Department Of Bioenvironmental Medicine Graduate School Of Medicine Chiba University
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Yamaguchi Toshio
Ulsi Research Laboratories Toshiba Corporation
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Yoshikawa Ryouichi
Ulsi Research Laboratories Toshiba Corporation
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Sato Koji
Department Of Anesthesia And Intensive Care Medicine Akita University Graduate School Of Medicine
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Okuyama Masanori
Area of Advanced Electronics and Optical Science, Department of Systems Innovation, Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama-cho, Toyonaka, Osaka 560-8531, Japan
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Kanashima Takeshi
Area of Advanced Electronics and Optical Science, Department of Systems Innovation, Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama-cho, Toyonaka, Osaka 560-8531, Japan
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MORI JUN
Department of Anesthesiology, Kurume University School of Medicine
著作論文
- The Substrate-film Lattice Mismatch in La0.7Ba0.3MnO3 Thin Films for Uncooled Infrared Bolometric Applications (特集 機能性酸化物薄膜材料とそのプロセス)
- Fabrication of Bi-La-Sr-Mn-O Uncooled Microbolometer : Semiconductors
- Bi-Substitution Effect in La-Sr-Mn-O Thin Films for Bolometric Applications : Surfaces, Interfaces, and Films
- Bismuth-Substituted Lanthanum Manganite for Bolometric Applications
- Studies of Localized Levels in HgCdTe Grown on Si and CdZnTe Substrates Using Metal-Organic Chemical Vapor Deposition
- Deep Levels in Hg_Cd_Te Grown by Metal-Organic Chemical Vapor Deposition
- Studies of Deep Levels in HgCdTe Grown on CdZnTe and Si Substrates
- Study of Deep Levels in Mesa-Type HgCdTe Device
- Deep Trap Measurement in Hg_Cd_xTe by Isothermal Capacitance and Deep-Level Transient Spectroscopy
- Optical Characterization of Gate Oxide Charging Damage by Photoreflectance Spectroscopy
- Optical Characterization of Gate Oxide Charging Damage by Photoreflectance Spectroscopy
- Contamination Charging up Effect in a Variably Shaped Electron Beam Writer
- Electron Beam Calibration Method for Character Projection Exposure System EX-8D
- Patterning Accuracy Estimation of Electron Beam Direct-Writing System EX-8D
- Evaluation of Shaping Gain Adjustment Accuracy Using Atomic Force Microscope in Variably Shaped Electron-Beam Writing Systems
- Secondary Photoacoustic Spectra of CdS: Cu by Gas-microphone Method : Photoacoustic Spectroscopy
- Profiles of Relativistic Electron Beams Focused with High-Temperature Superconducting Lenses (Supertrons)
- Focusing of Intense Electron Beams with Novel High-T_c Superconducting Lenses
- High-T_c Superconducting Lenses for Intense Charged Particle Beams and Its Applications to Induction Linacs
- Triangular Shaped Beam Technique in EB Exposure System EX-7 for ULSI Pattern Formation : Lithography Technology