Hinode Kenji | Central Research Laboratory Hitachi Ltd.
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概要
関連著者
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Hinode Kenji
Central Research Laboratory Hitachi Ltd.
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Hinode Kenji
Central Research Laboratory Hitachi Lid.
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武田 健一
日立製作所 中央研究所
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Takeda Ken-ichi
Central Research Laboratory Hitachi Ltd.
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Hinode Kenji
Istec/srl
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NOGUCHI Junji
Device Development Center, Hitachi Ltd.
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YAMAGUCHI Hizuru
Device Development Center, Hitachi Ltd.
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Noguchi Junji
Device Development Center Hitachi Ltd.
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Yamaguchi Hizuru
Device Development Center Hitachi Ltd.
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Takeda Ken'ichi
Central Research Laboratory Hitachi Ltd.
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Takeda Ken-ichi
Central Research Laboratory, Hitachi Ltd., Kokubunji-shi, Tokyo 185-8601, Japan
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Takeda Ken-ichi
Hitachi, Ltd., Central Research Laboratory, 1-280 Higashikoigakubo Kokubunji-shi, Tokyo 185-8601, Japan
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Takeda Ken-ichi
Hitachi, Ltd., Central Research Laboratory, Kokubunji, Tokyo 185-8601, Japan
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Takeda Ken-ichi
Central Research Laboratory, Hitachi Ltd., Higashikoigakubo, Kokubunji, Tokyo 185-8601, Japan
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TANIGAWA Shoichiro
Institute of Materials Science, The University of Tsukuba
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Cho Y‐k
Univ. Tsukuba Ibaraki
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Cho Yang-koo
Institute Of Materials Science University Of Tsukuba:(present Address)korea Standards Institute
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Cho Yang-koo
Institute Of Materials Science University Of Tsukuba:(present Address)korea Research Institute)
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WEI Long
Institute of Materials Science, University of Tsukuba
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DOSHO Chisei
Institute of Materials Science, University of Tsukuba
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Wei L
Institute Of Materials Science University Of Tsukuba
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Wei Long
Institute Of Materials Science University Of Tsukuba
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Dosho Chisei
Institute Of Materials Science University Of Tsukuba
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Tanigawa Shoichiro
Institute Of Applied Physics University Of Tsukuba
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Kodama Daisuke
Central Research Laboratory Hitachi Ltd.
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YAMAGUCHI Hizuru
Renesas Technology Corp.
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Tanigawa S
Institute Of Applied Physics University Of Tsukuba
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HANAOKA Yuko
Central Research Laboratory, Hitachi, Ltd.
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Hanaoka Yuko
Central Research Laboratory Hitachi Ltd.
著作論文
- Variable-Energy Positron Studies of Vacancy-Type Defects in TiN Films on Si
- Light Emission Analysis of Dielectric Breakdown in Stressed Damascene Copper Interconnection
- Dielectric Breakdown and Light Emission in Copper Damascene Structure under Bias-Temperature Stress
- Increase in Electrical Resistivity of Copper and Aluminum Fine Lines