Kyuno Kentaro | Institute Of Industrial Science University Of Tokyo
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概要
関連著者
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Kyuno Kentaro
Institute Of Industrial Science University Of Tokyo
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弓野 健太郎
Department Of Materials Engineering School Of Engineering The University Of Tokyo
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弓野 健太郎
東大教養
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KYUNO Kentaro
Department of Materials Science, Graduate School of Engineering, The University of Tokyo
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TORIUMI Akira
Department of Materials Science, Graduate School of Engineering, The University of Tokyo
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Toriumi Akira
The Authors Are With Advanced Lsi Technology Laboratory Toshiba Corporation:presently With The Depar
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Toriumi Akira
Department Of Applied Physics University Of Tokyo
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Kyuno Kentaro
Department Of Materials Science Shibaura Institute Of Technology
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Kyuno Kentaro
Department of Materials Engineering, School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8656, Japan
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KITA Koji
Department of Materials Science, Graduate School of Engineering, The University of Tokyo
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Kita Koji
Department Of Materials Engineering School Of Engineering The University Of Tokyo
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Kita Koji
Department of Material Engineering, The University of Tokyo, Bunkyo, Tokyo 113-8656, Japan
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Toriumi Akira
Mirai-advanced Semiconductor Research Center (mirai-asrc) National Institute Of Advanced Industrial
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Toriumi Akira
Advanced Lsi Technology Toshiba Corporation
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Asano Setsuro
The Graduate School Of/college Of Arts And Sciences The University Of Tokyo
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Toriumi Akira
Mirai-asrc Aist
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Toriumi A
Univ. Tokyo Tokyo Jpn
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Kita Koji
Department Of Materials Engineering The University Of Tokyo
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山口 正剛
日本原子力研究所 計算科学技術推進センター
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日下部 鉄也
花王素材研
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浅野 攝郎
東大総合文化
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Toriumi Akira
Department Of Materials Engineering The University Of Tokyo
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弓野 健太郎
東大生研
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神子 公男
東大生研
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河 在根
韓国光云大工
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山本 良一
東京大学生産技術研究所
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弓野 健太郎
東大生産研
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弓野 健太郎
東大先端研
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山口 正剛
原研計科技セ
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浅野 攝郎
東大院総合
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Kamiko M
Institute Of Industrial Science University Of Tokyo
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Kamiko Masao
Institute For Materials Research Tohoku University:(present Address)institute Of Industrial Science
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Kamiko Masao
Institute For Materials Research Tohoku University
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浅野 摂郎
東大教養
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浅野 攝郎
東京大学大学院 総合文化研究科
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光田 好孝
東大生研
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光田 好孝
東京大学生産技術研究所
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Zhao Yi
Department Of Materials Engineering School Of Engineering The University Of Tokyo
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YAMAMOTO Yoshiki
Department of Materials Engineering, School of Engineering, The University of Tokyo
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弓野 健太郎
東京大学生産技術研究所
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Yamamoto R
Univ. Tokyo Tokyo Jpn
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光田 好孝
東大 生産技研
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野瀬 健二
東京大学 生産技術研究所
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Yamamoto R
Kyoto Univ. Kyoto Jpn
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Yamamoto Yoshiki
Department Of Materials Engineering School Of Engineering The University Of Tokyo
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Zhao Yi
Department Of Chemistry Tongji University
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具 正祐
韓国光云大
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末永 亮
芝浦工大
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野瀬 健二
東大生研
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弓野 健太郎
芝浦工大
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日下部 鉄也
花王(株)素材プロセス研究所
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山口 正剛
日本原子力機構
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YAMAMOTO Ryoichi
Department of Physics, Kyoto University
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山本 良一
東大先端研
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山本 良一
東大生研
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浅野 攝郎
東大教養
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Toyama Masahiro
Department Of Materials Engineering School Of Engineering The University Of Tokyo
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山口 正剛
原研
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Komoda Taiki
Department Of Materials Science Graduate School Of Engineering The University Of Tokyo
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Toriumi Akira
Department Of Materials Engineering School Of Engineering The University Of Tokyo
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YAMAMOTO Ryoichi
Institute of Industrial Science, University of Tokyo
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ASANO Setsuro
College of Arts and Sciences, University of Tokyo
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Ha Jae-genu
Institute Of Industrial Science University Of Tokyo
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Toyama Masahiro
Department Of Cardiology Institute Of Clinical Medicine University Of Tsukuba
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浅野 攝郎
東大
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Yamamoto Ryoichi
Institute Of Industrial Science University Of Tokyo
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Yamamoto Ryoichi
Institute For Chemical Research Kyoto University:fuji Photo Film Co. Ltd.
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河 在根
韓国光云大
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Ha Jae-Geun
Institute of Industrial Science, University of Tokyo
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ASANO Setsuro
Institute of Physics, College of Arts and Sciences, University of Tokyo
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NOMURA Hideyuki
Department of Internal Medicine, Shin-Kokura Hospital
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岩波 瑞樹
東大生研
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岩波 瑞樹
東京大学
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河 在根
東大生研
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ENDO Yasuhiro
Department of Materials Science, Graduate School of Engineering, The University of Tokyo
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Endo Yasuhiro
Department Of Materials Science Graduate School Of Engineering The University Of Tokyo
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TOMIDA Kazuyuki
Research Fellow of the Japan Society for the Promotion of Science
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TOMIDA Kazuyuki
Department of Materials Engineering, School of Engineering, The University of Tokyo
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SHIMIZU Haruka
Department of Materials Science, School of Engineering, The University of Tokyo
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SASAGAWA Masashi
Department of Materials Science, School of Engineering, The University of Tokyo
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Ehrlich Gert
Univ. of Illinois
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Ehrlich Gert
University of Illinois
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Yamamoto Ryoichi
Research Center for Advanced Science and Technology, University of Tokyo
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Nomura Hideyuki
Department Of Electronics The University Of Electro-communications
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HA Jac-Geun
Institute of Industrial Science, University of Tokyo
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HA Jae-Genu
Institute of Industrial Science,University of Tokyo
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KYUNO Kentaro
Research Center for Advanced Science and Technology,University of Tokyo
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日下部 鉄也
花王素材プロセス研究所
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Toriumi Akira
Advanced Lsi Technology Laboratory Research & Development Center Toshiba Co.
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Asano Setsuro
Institute For Solid State Physics The University Of Tokyo
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Sasagawa Masashi
Department Of Materials Science School Of Engineering The University Of Tokyo
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日下部 鉄也
花王文理研
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Nomura Hideyuki
Department Of Materials Engineering School Of Engineering The University Of Tokyo
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Shimizu Haruka
Department Of Materials Science School Of Engineering The University Of Tokyo
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河 在銀
韓国光云大
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Endo Yasuhiro
Department Of Internal Medicine Heart Institute Japan Tokyo Women's Medical College
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Yamamoto Ryoichi
Research Center For Advanced Science And Technology University Of Tokyo
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Nomura Hideyuki
Department of Electronic Engineering, The University of Electro-Communications
著作論文
- Study of La Concentration Dependent V_ Shift in Metal/HfLaOx/Si Capacitors
- Au/(Fe-Co)の人工格子の垂直磁気異方性
- Performance and Degradation in Single Grain-size Pentacene Thin-Film Transistors
- Field-Dependent Mobility of Highly Oriented Pentacene Thin-Film Transistors
- Suppression of Leakage Current and Moisture Absorption of La_2O_3 films with Ultraviolet Ozone Post Treatment
- Thermally Robust Y_2O_3/Ge MOS Capacitors
- Moisture Absorption-Induced Permittivity Deterioration and Surface Roughness Enhancement of Lanthanum Oxide Films on Silicon
- Design Methodology for La_2O_3-Based Ternally Higher-κ Dielectrics
- A New Hf-based Dielectric Member, HfLaOx, for Amorphous High-k Gate Insulators in Advanced CMOS
- Generalized Model of Oxidation Mechanism at HfO_2/Si Interface with Post-Deposition Annealing
- Dielectric Constant Increase of Yttrium-Doped HfO_2 by Structural Phase Modification
- Far Infrared Study of Structural Distortion and Transformation of HfO_2 by Introducing a Slight Amount of Si
- Stable Observation of the Evolution of Leakage Spots in HfO_2/SiO_2 stacked structures by UHV-C-AFM
- Difference between O_2 and N_2 Annealing Effects on CVD-SiO_2 Film Quality Studied by the Time-Dependent OCP Measurement
- Advantages of Ge (111) Surface for High Quality HfO_2/Ge Interface
- New Method for Characterizing Dielectric Properties of High-k Films with Time-Dependent Open-Circuit Potential Measurement
- 24aW-13 FIMによるPtクラスターの表面拡散挙動の直接観察
- 30p-N-1 FIMによるPt(111)上のステップエッジバリアの測定
- Perpendicular Magnetic Anisotropy of Metallic Multilayers Composed of Magnetic Layers Only: Ni/Co and Ni/Fe Multilayers
- First-Principles Calculation of the Magnetic Anisotropy Energies of Ag/Fe(001) and Au/Fe(001) Multilayers
- Theoretical Study on the Magnetocrystalline Anisotropy of X/Co (X=Pd,Pt,Cu,Ag,Au) Multilayers
- PtMnSb, MnBi, MnPt_3の磁気光学Kerrスペクトルの第一原理計算
- 22pE-12 Mn_TM_xPt_3(TM=Fe,Co)合金の磁気光学効果の第一原理計算
- MnPt_3, PtMnSb, MnBiの磁気光学Kerr効果の第一原理計算
- L1_0型規則合金の磁気光学Kerr効果の第一原理計算
- 25a-YH-11 遷移金属合金・多層膜の磁気光学Kerr効果の第一原理計算III
- L1_0型規則合金の磁気光学Kerr効果の第一原理計算
- 25p-N-1 Co系金属超格子の垂直磁気異方性エネルギーの第一原理計算(II)
- 30a-PS-17 Co系金属超格子の垂直磁気異方性エネルギーの第一原理計算
- 30a-APS-38 Co系金属超格子の垂直磁気異方性の物理的起源
- 28pTH-5 凝集現象を用いた自己組織化ナノドット薄膜の作製(28pTH 表面界面構造(金属),領域9(表面・界面,結晶成長))
- 30a-X-12 遷移金属合金・多層膜の磁気光学Kerr効果の第一原理計算II
- 8a-YH-7 遷移金属合金・多層膜の磁気光学Kerr効果の第一原理計算
- FIMによるステップエッジバリアの測定--原子レベルでの薄膜結晶成長機構の解明を目指して
- 金属多層膜, 希土類 : 遷移金属化合物の結晶磁気異方性の第一原理計算
- 23pPSA-13 凝集現象を用いた自己組織化Agナノドット薄膜の微細構造制御(23pPSA 領域9ポスターセッション,領域9(表面・界面,結晶成長))
- 21aRC-1 凝集現象を用いた自己組織化金属ナノ構造薄膜の作製(21aRC 結晶成長,領域9(表面・界面,結晶成長))