Yasuda N | Tokyo Inst. Technol. Tokyo
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概要
関連著者
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Yasuda N
Tokyo Inst. Technol. Tokyo
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Yasuda Naoki
Corporate Research & Development Center Toshiba Corporation
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Yasuda Naoki
Advanced Lsi Technology Laboratory Research & Development Center Toshiba Co.
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YANAGIDA Shozo
Material and Life Science, Graduate School of Englneering, Osaka University
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WADA Yuji
Material and Life Science, Graduate School of Englneering, Osaka University
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Yanagida Shozo
Material And Life Science Graduate School Of Engineering Osaka University
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YAMAMOTO Shigeyuki
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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Wada Yuji
Department Of Applied Chemistry Graduate School Of Science And Engineering Tokyo Institute Of Techno
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Wada Y
Research Laboratories Ashigara Fuji Photo Film Co. Ltd.
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Wada Yuji
Material And Life Science Graduate School Of Engineering Osaka University
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Nakata Y
Fujitsu Ltd. Atsugi Jpn
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Nishikawa Y
Toshiba Corp. Kawasaki Jpn
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Nishikawa Y
Materials And Devices Research Laboratories Toshiba Corporation
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Nishikawa Yukie
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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Nishikawa Yukie
Corporate Research & Development Center Toshiba Corporation
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NOBUTOKI Hideharu
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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Nobutoki Hideharu
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Fukushima N
Corporate Research & Development Center Toshiba Corporation
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Ikegawa Sumio
Corporate Research & Development Center Toshiba Corporation
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WADA Yuji
Chemical Process Engineering, Faculty of Engineering, Osaka University
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YANAGIDA Shozo
Chemical Process Engineering, Faculty of Engineering, Osaka University
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HASEGAWA Yasuchika
Material and Life Science, Graduate School of Engineering, Osaka University
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FUKUSHIMA Noburu
Corporate R&D Center, Toshiba Corporation
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FUKUSHIMA Noburu
Advanced LSI Technology Laboratory, Corporate Research & Development Center, Toshiba Corporation
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NAKAYAMA Kohei
Corporate Research & Development Center, Toshiba Corporation
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Nakayama Kohei
Corporate Research & Development Center Toshiba Corporation
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MINAMI Shintaro
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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ADACHI Hiroshi
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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NAGAE Suguru
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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MARUO Katsuya
Chemical Process Engineering, Faculty of Engineering, Osaka University
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YASUDA Naoki
Chemical Process Engineering, Faculty of Engineering, Osaka University
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Hasegawa Yasuchika
Material And Life Science Graduate School Of Engineering Osaka University
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Hasegawa Yasuchika
Graduate School Of Material Science Nara Institute Of Science And Technology
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Nagae Suguru
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Maruo Katsuya
Chemical Process Engineering Faculty Of Engineering Osaka University
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Adachi H
Osaka Univ. Osaka Jpn
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Yanagida Shozo
Chemical Process Engineering Faculty Of Engineering Osaka University
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Minami Shintaro
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Fukushima Noburu
Advanced Lsi Technology Laboratory Corporate R&d Center Toshiba Corporation
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Wada Yuji
Chemical Process Engineering Faculty Of Engineering Osaka University
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Ikegawa Sumio
Corporate R&D Center, Toshiba Corporation, Kawasaki 212-8582, Japan
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Nisikawa Yukie
Corporate Research & Development Center, Toshiba Corporation
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Adachi Hiroshi
Advanced Technology R&D Center, Mitsubishi Electric Corporation
著作論文
- Electrical Properties of Single Crystalline CeO_2 High-k Gate Dielectrics Directly Grown on Si(111)
- Direct Growth of Single Crystalline CeO_2 High-k Gate Dielectrics
- Novel Silicone Polymeric Material with High Thermal Stability for Optical Waveguides
- Polyphenylsilsesquioxane Partially-substituted with Germanium : Refractive Index Controllability and Thermal Stability
- A Novel Heat-Resist Silicone Polymeric Material with Refractive Index Controllability
- A Novel Photosensitive Silicone Ladder Polymer: Synthesis, Photochemical, and Thermal Characterstics
- Heeterogeneous Photocatalysis of Poly(4-trifluoromethylpyridine-2,6-diyl)