Ikegawa Sumio | Corporate Research & Development Center Toshiba Corporation

スポンサーリンク

概要

• 同名の論文著者
• Corporate Research & Development Center Toshiba Corporationの論文著者

関連著者

• Ikegawa Sumio

  Corporate Research & Development Center Toshiba Corporation

• Ikegawa Sumio

  Corporate R&D Center, Toshiba Corporation, Kawasaki 212-8582, Japan

• Arai Masao

  National Institute For Research In Inorganic Materials

• Arai Masao

  National Institute For Materials Science

• Nakata Y

  Fujitsu Ltd. Atsugi Jpn

• Yasuda N

  Tokyo Inst. Technol. Tokyo

• Arai M

  National Institute For Materials Science

• Arai M

  Department Of Applied Physics University Of Tokyo

• Nishikawa Y

  Toshiba Corp. Kawasaki Jpn

• Nishikawa Y

  Materials And Devices Research Laboratories Toshiba Corporation

• Nishikawa Yukie

  Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation

• Nishikawa Yukie

  Corporate Research & Development Center Toshiba Corporation

• FUKUSHIMA Noburu

  Corporate R&D Center, Toshiba Corporation

• Yasuda Naoki

  Corporate Research & Development Center Toshiba Corporation

• NAKAYAMA Kohei

  Corporate Research & Development Center, Toshiba Corporation

• Arai M

  Computational Materials Science Center (cmsc) National Institute Of Materials Science (nims)

• Nakayama Kohei

  Corporate Research & Development Center Toshiba Corporation

• Tanamoto Tetsufumi

  Corporate R&d Center Toshiba Corporation

• Fujita Shinobu

  Corporate R&d Center Toshiba Corporation

• Arai M

  Univ. Tokyo Tokyo Jpn

• Yoda Hiroaki

  Corporate Research & Development Center Toshiba Corporation

• Arai Masao

  Computational Materials Science Center National Institute For Materials Science

• Fukushima N

  Corporate Research & Development Center Toshiba Corporation

• Matsumoto Mari

  Corporate R&D Center, Toshiba Corporation, Kawasaki 212-8582, Japan

• Shimomura Naoharu

  Corporate R&D Center, Toshiba Corporation, Kawasaki 212-8582, Japan

• Yoda Hiroaki

  Corporate R&D Center, Toshiba Corporation, Kawasaki 212-8582, Japan

• IKEGAWA Sumio

  Corporate Research & Development Center, Toshiba Corporation

• Nisikawa Yukie

  Corporate Research & Development Center, Toshiba Corporation

• Shimomura Naoharu

  Corporate R&D Center, Toshiba Corporation, Kawasaki 212-8582, Japan

もっと見る 閉じる

著作論文

• Electrical Properties of Single Crystalline CeO_2 High-k Gate Dielectrics Directly Grown on Si(111)
• Electronic Structures of (Pb_2Cu)Sr_2Eu_xCe_Cu_2O_ (n = 2, 3) : Effect of Fluorite Blocks between Adjacent CuO_2 Layers (Condensed Matter: Electronic Structure, Electrical, Magnetic and Optical Properties)
• Electronic Structures of (Pb_2Cu)Sr_2Eu_xCe_Cu_2O_ (n = 2, 3) : Effect of Fluorite Blocks between Adjacent CuO_2 Layers
• High-Speed Magnetoresistive Random-Access Memory Random Number Generator Using Error-Correcting Code

スポンサーリンク