Epitaxial Growth of TiN on Al_2O_3 at Cryogenic Temperature
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概要
- 論文の詳細を見る
- 2003-02-15
著者
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Chen W‐c
Department Of Materials Science And Engineering National Tsing-hua University
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Chen Wei-chuan
Department Of Materials Science And Engineering National Tsing-hua University
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WU Shinn-Tyan
Department of Materials Science and Engineering, National Tsing-Hua University
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Wu Shinn-tyan
Department Of Material Science And Engineering National Tsing-hua University
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Wu S‐t
Department Of Materials Science And Engineering National Tsing-hua University
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Chen Wei-chuan
Department Of Chemical Engineering National Tsing Hua University
関連論文
- Epitaxial Growth of C54 TiSi_2 on Si (001) as Revealed by High Resolution Transmission Electron Microscope
- Epitaxial Growth of TiN(100) on Si(100) by Reactive Magnetron Sputtering at Low Temperature
- Epitaxial Growth of C54 TiSi_2 on Si(001) by Self-Aligned Process
- Dual-Layer Structure of Ti on Al_2O_3(0001) Grown Epitaxially at Room Temperature
- Heteroepitaxial TiN of Very Low Mosaic Spread on Al_2O_3
- Epitaxial Growth of TiN on Al_2O_3 at Cryogenic Temperature
- Epitaxial Growth of TiSi_2 (C49) on (001)Si by Rapid Thermal Annealing
- Epitaxial Growth of TiC (002) on Si (001) by Reactive Magnetron Sputtering at Low Temperatures
- Influence of Interfacial Oxide on Self-Alignment Silicide Process
- Compare the effects of chondrogenesis by culture of human mesenchymal stem cells with various type of the chondroitin sulfate C(CELL AND TISSUE ENGINEERING)
- Heteroepitaxial TiN of Very Low Mosaic Spread on Al2O3
- Epitaxial Growth of TiN(100) on Si(100) by Reactive Magnetron Sputtering at Low Temperature
- Dual-Layer Structure of Ti on Al2O3(0 0 0 1) Grown Epitaxially at Room Temperature
- Epitaxial Growth of TiN on Al2O3 at Cryogenic Temperature
- Influence of Interfacial Oxide on Self-Alignment Silicide Process
- Epitaxial Growth of TiC (002) on Si (001) by Reactive Magnetron Sputtering at Low Temperatures