Epitaxial Growth of TiN(100) on Si(100) by Reactive Magnetron Sputtering at Low Temperature

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概要

• 論文の詳細を見る
• Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
• 1998-06-01

著者

• WU Shinn-Tyan

  Department of Materials Science and Engineering, National Tsing-Hua University

• Wu Shinn-tyan

  Department Of Materials Science And Engineering National Tsing-hua University

• SHEU Wei-Hwa

  Department of Materials Science and Engineering, National Tsing-Hua University

関連論文

• Epitaxial Growth of C54 TiSi_2 on Si (001) as Revealed by High Resolution Transmission Electron Microscope
• Epitaxial Growth of TiN(100) on Si(100) by Reactive Magnetron Sputtering at Low Temperature
• Epitaxial Growth of C54 TiSi_2 on Si(001) by Self-Aligned Process
• Dual-Layer Structure of Ti on Al_2O_3(0001) Grown Epitaxially at Room Temperature
• Heteroepitaxial TiN of Very Low Mosaic Spread on Al_2O_3
• Epitaxial Growth of TiN on Al_2O_3 at Cryogenic Temperature
• Epitaxial Growth of TiSi_2 (C49) on (001)Si by Rapid Thermal Annealing
• Epitaxial Growth of TiC (002) on Si (001) by Reactive Magnetron Sputtering at Low Temperatures
• Influence of Interfacial Oxide on Self-Alignment Silicide Process

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