A Resolution Enhancement Material for 193-nm Lithography Comprising 2-Hydroxybenzyl Alcohol and Poly(vinyl alcohol) with Uniform Resist Pattern Shrinkage
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概要
著者
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Nozaki K
Department Of Physics Nagoya University
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NOZAKI Koji
Fujitsu Laboratories Ltd.
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YANO Ei
Fujitsu Laboratories Ltd.
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Igarashi M
Joint Research Center For Atom Technology(jrcat) Angstrom Technology Partnership
関連論文
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- A Resolution Enhancement Material for 193-nm Lithography Comprising 2-Hydroxybenzyl Alcohol and Poly(vinyl alcohol) with Uniform Resist Pattern Shrinkage
- Renormalization Analysis of Resonance Structure in a 2-D Symplectic Map
- Asymptotic Expansions of Unstable and Stable Manifolds in Time-Discrete Systems