NOZAKI Koji | Fujitsu Laboratories Ltd.
スポンサーリンク
概要
関連著者
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Nozaki K
Department Of Physics Nagoya University
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NOZAKI Koji
Fujitsu Laboratories Ltd.
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YANO Ei
Fujitsu Laboratories Ltd.
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Watanabe Katsuyuki
National Research Institute For Metals : Department Of Material Science And Technology Science Unive
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Watanabe K
Department Of Physics Tokyo University Of Science
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Wakisaka K
Sanyo Electric Co. Ltd. Hirakata‐shi Jpn
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WATANABE Ken-ichi
Institute for Nuclear Study, University of Tokyo
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Igarashi M
Joint Research Center For Atom Technology(jrcat) Angstrom Technology Partnership
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Yamamoto S
Japan Atomic Energy Research Institute Department Of Fusion Plasma Research Experimental Plasma Phys
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Yamabe T
Tokyo Inst. Technol. Tokyo Jpn
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Yamamoto T
Department Of Applied Chemistry Himeji Institute Of Technology
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Yamamoto T
Institute For Solid State Physics The University Of Tokyo
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Yasuda T
Graduate School Of Science Osaka University
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Yamamoto T
Tsukuba Research Center Sanyo Electric Co. Ltd.
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Yamauchi Toshihiko
Division Of Thermonuclear Fusion Research Japan Atomic Energy Research Institute
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Yamamoto Takenori
Deptarment Of Electrical And Electronic Engineering Toyohashi University Of Technology
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Yamamoto Tokujirou
Department Of Materials Science And Engineering Kyoto University
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Yamamoto T
Japan Atomic Energy Research Inst. Tokai
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WATANABE Keiji
Fujitsu Laboratories Ltd.
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NAMIKI Takahisa
Fujitsu Laboratories Ltd.
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IGARASHI Miwa
Fujitsu Laboratories Ltd.
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KURAMITSU Yoko
Fujitsu Laboratories Ltd.
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Yamamoto T
Institute For Molecular Science And Graduate University For Advanced Studies:(present Office)riken
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Yamamoto Teiji
Department Of Electronics Faculty Of Technology Kanazawa University
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Yano Ei
Fujitsu Laboratories
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YAMAMOTO Takashi
Faculty of Science, Yamaguchi University
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Yamamoto Takayoshi
The Institute Of Scientific And Industrial Research Osaka University
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Yamashiro Tomoki
Department Of Electrical Engineering Faculty Of Engineering Science Osaka University
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Yamamoto Takahisa
Department Of Applied Physics Osaka University
著作論文
- A New Single-Layer Resist for 193-nm Lithography
- A Novel Polymer for a 193-nm Resist
- X-ray and thermal studies on the crystalline phases of normal alkanethiols n-CnH2n+1SH (n=18, 19, 22, 23, 24)
- A Resolution Enhancement Material for 193-nm Lithography Comprising 2-Hydroxybenzyl Alcohol and Poly(vinyl alcohol) with Uniform Resist Pattern Shrinkage