Annealing Stability of NbN/Pb Josephson Tunnel Junctions with Plasam Oxidized Barriers
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1984-02-20
著者
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Hikita M
Ntt Advanced Technol. Corp. Ibaraki Jpn
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Hikita Makoto
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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Hikita Makoto
Ntt Photonics Laboratories
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IWATA Tsunekazu
NTT Opto-Electronics Laboratory
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Igarashi M
Joint Research Center For Atom Technology(jrcat) Angstrom Technology Partnership
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IWATA Tsunekazu
Ibaraki Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation
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IGARASHI Masaru
Ibaraki Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation
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Iwata Tsunekazu
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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Iwata T
Hokkaido Tokai Univ. Sapporo Jpn
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Igarashi Masaru
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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