Examination of the Properties of Superconducting Nb-Ge Films Prepared by DC Magnetron Sputtering
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概要
- 論文の詳細を見る
The superconductivity and film structure of A15 Nb-Ge were extensively examined through film preparation utilizing the characteristic features of dc magnetron sputtering. T_<co> 22.9 K and ?T_c 0.5 K films of 2400 Å thickness were obtained. Films of T_<co>>22 K and ?T_c> 1 K could be prepared with good reproducibility. As a result of Auger analysis, it was concluded that impurities, especially oxygen, were unnecessary for metastable high-T_c Nb_3Ge phase growth. Impurity oxygen was concentrated into a depositing film from surface impurity-rich layer and tended to make a hexagonal Nb_5Ge_3 phase formed. In order to control this and to attain high-T_c, film fabrication with a high deposition rate over short sputtering time was effective. A high-T_c Nb_3Ge phase grew on a base layer 1000-1500 Å thick. The layer was found to contain no impurities and rather to be rich in anti-site defects.
- 社団法人応用物理学会の論文
- 1982-04-20
著者
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NAKAMURA Kiko
Ibaraki Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation
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Nakamura Kiko
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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Kubo Shugo
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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IGARASHI Masaru
Ibaraki Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation
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Igarashi Masaru
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
関連論文
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- Liftoff Patterning of Superconductive NbN Films Using Polyimide Masks
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