Early Stages of Sn-Doped In
スポンサーリンク
概要
- 論文の詳細を見る
The early stages of Sn-doped In<inf>2</inf>O<inf>3</inf>(ITO) film growth on amorphous SiO<inf>2</inf>(a-SiO<inf>2</inf>) surfaces were observed by atomic force microscopy (AFM) and transmission electron microscopy (TEM). AFM measurements clearly showed that the surface morphologies of the ITO films (3--6 nm in thickness) possessed an extended hill-and-valley structure. TEM analysis revealed that small ITO islands on the a-SiO<inf>2</inf>surface could aggregate, resulting in the formation of larger ITO islands approximately 15--30 nm in diameter. The combined results indicate that the ITO film growth on a-SiO<inf>2</inf>surfaces is similar to that on glass surfaces.
- 2013-12-25
著者
-
Nakamura Shin-ichi
Center For Instrumental Analysis Aoyama Gakuin University
-
Oka Nobuto
Graduate School Of Science And Engineering Aoyama Gakuin University
-
Sato Yasushi
Graduate School Of Science And Engineering Aoyama Gakuin University
-
Shigesato Yuzo
Graduate School Of Science And Engineering Aoyama Gakuin University
-
Nakamura Shin-ichi
Center for Instrumental Analysis, Aoyama Gakuin University, Sagamihara 229-8558, Japan
-
Oka Nobuto
Graduate School of Science and Engineering, Aoyama Gakuin University, Sagamihara 229-8558, Japan
-
Oka Nobuto
Graduate School of Frontier Sciences, The University of Tokyo
関連論文
- ニューガラス関連学会 The 8th International Conference on Coatings on Glass and Plastics (ICCG8)の会議報告
- 透明導電膜に関する最近の研究動向 (特集 モバイルを支えるガラス)
- Transmission Electron Microscopy Observation on the Early Stages of Sn-Doped In_2O_3 Film Growth Deposited on Amorphous Carbon Films by DC Magnetron Sputtering
- サーモリフレクタンス法を用いたAlq_3およびα-NPD薄膜の熱物性に関する研究(2)
- TiO_2およびNbドープTiO_2薄膜の熱拡散率測定
- 3ω法によるIZO透明導電膜の熱伝導率測定(2)
- Photocatalytic Properties of TiO_2 Films Deposited by Reactive Sputtering in Mid-Frequency Mode with Dual Cathodes
- Carrier Density Dependence of Optical Band Gap and Work Function in Sn-Doped In_2O_3 Films
- High Rate Reactive Sputter Deposition of TiO2 Films for Photocatalyst and Dye-Sensitized Solar Cells
- Oxidation Resistance of Ti--Si--N and Ti--Al--Si--N Films Deposited by Reactive Sputtering Using Alloy Targets
- Thermal Diffusivities of Tris(8-hydroxyquinoline)aluminum and N,N$'$-Di(1-naphthyl)-N,N$'$-diphenylbenzidine Thin Films with Sub-Hundred Nanometer Thicknesses
- NbドープTiO_2薄膜の熱拡散率に対するNb添加効果
- Thermal Boundary Resistance between N,N'-Bis(1-naphthyl)-N,N'-diphenylbenzidine and Aluminum Films
- Effect of Oxygen Impurities on Thermal Diffusivity of AlN Thin Films Deposited by Reactive RF Magnetron Sputtering
- Effects of Botrytis cinerea-derived elicitor on tracheary element differentiation and lignification of isolated Zinnia mesophyll cells
- Thermophysical Properties of Transparent Conductive Nb-Doped TiO Films
- Electronic State of Amorphous Indium Gallium Zinc Oxide Films Deposited by DC Magnetron Sputtering with Water Vapor Introduction
- Material Database Syndication with RSS
- Photocatalytic Activity of WO3 Films Crystallized by Postannealing in Air
- Electronic State of Amorphous Indium Gallium Zinc Oxide Films Deposited by DC Magnetron Sputtering with Water Vapor Introduction
- Characterization of GaSb/AlGaSb Multi-Quantum-Well Structures Grown on Si(001) Substrates
- Structure and Internal Stress of Tin-Doped Indium Oxide and Indium–Zinc Oxide Films Deposited by DC Magnetron Sputtering
- Effects of Energetic Ion Bombardment on Structural and Electrical Properties of Al-Doped ZnO Films Deposited by RF-Superimposed DC Magnetron Sputtering
- 日本熱物性学会賞奨励賞を受賞して
- Early Stages of Sn-Doped In
- Thermal Boundary Resistance of W/Al₂O₃ Interface in W/Al₂O₃/W Three-Layered Thin Film and Its Dependence on Morphology
- マテリアルニュース&トピックス 酸化状態を経由しない高品質グラフェンの量産化技術 : 超臨界流体剥離法
- Early Stages of Sn-Doped In₂O₃ Film Growth on Amorphous SiO₂ Surfaces Observed by Atomic Force Microscopy and Transmission Electron Microscopy
- Thermal Conductivity of Amorphous Indium-Gallium-Zinc Oxide Thin Films
- 超臨界流体を用いた機能性ナノグラフェンの量産化プロセスの開発 (特集 革新的プロセス開発の新展開)
- 新しく炭素材料実験を始める人のために 超臨界流体によるグラフェンの量産化技術
- 超臨界流体によるグラフェンの量産化技術
- Thermal Conductivity of Amorphous Indium-Gallium-Zinc Oxide Thin Films