Acceptor Levels due to a Complex Including the Nitrogen--Hydrogen Bond in GaAsN Films Grown by Chemical Beam Epitaxy

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概要

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• The acceptor levels and their concentration in GaAsN films grown by the chemical beam epitaxy technique were investigated through detailed analysis of the temperature dependence of hole concentration. Two acceptor levels A<inf>1</inf>and A<inf>2</inf>were found, and their energy levels were fixed at 130 \pm 20 and 55 \pm 10 meV, respectively, from the valence band maximum. Both concentrations were on the order of 10^{17} cm^-3and compensated by the concentration of donor on the same order. The concentration of A<inf>1</inf>had a linear relationship with the number of N--H bonds in films grown at the same growth temperature, while the slope decreased with growth temperature. These results strongly suggested that a complex defect including the N--H bond was the origin of the A<inf>1</inf>acceptor level.

• 2013-05-25

著者

• Ikari Tetsuo

  Faculty Of Engineering Miyazaki University

• Suzuki Hidetoshi

  Interdisciplinary Research Organization, University of Miyazaki, Miyazaki 889-2192, Japan

• Fukuyama Atsuhiko

  Faculity of Engineering, University of Miyazaki, Miyazaki 889-2192, Japan

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