Transmission Characteristics of Hydrogenated Microcrystalline Silicon Wire Waveguide at a Wavelength of 1.55 μm
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概要
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We propose hydrogenated microcrystalline silicon (μc-Si:H) as an alternative to hydrogenated amorphous silicon for optical waveguide applications with higher stability against photoinduced degradation. A 180-nm-thick μc-Si:H film containing silicon nanocrystallites with a grain size of {\sim}20 nm was deposited by plasma-enhanced chemical vapor deposition at 250 °C. The transmission losses of μc-Si:H wire waveguides with widths of 420, 470, and 570 nm were 10.1, 6.7, and 6.5 dB/cm for the transverse electric mode, and 9.6, 5.2, and 4.7 dB/cm for the transverse magnetic mode, respectively. From the measured losses, we estimated material-induced scattering loss of less than {\sim}7 dB/cm.
- 2012-08-25
著者
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SAKAKIBARA Youichi
National Institute of Advanced Industrial Science and Technology (AIST)
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Suzuki Masao
National Inst. Radiological Sci. Chiba Jpn
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Mori Masahiko
National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Kamei Toshihiro
National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan
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Kamei Toshihiro
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
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Takei Ryohei
National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan
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Manako Shoko
National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan
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Omoda Emiko
National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan
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MANAKO Shoko
National Institute of Advanced Industrial Science and Technology
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TAKEI Ryohei
National Institute of Advanced Industrial Science and Technology
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Suzuki Masao
National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan
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SAKAKIBARA Youichi
National Institute of Advanced Industrial Science and Technology
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Sakakibara Youichi
National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan
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OMODA Emiko
National Institute of Advanced Industrial Science and Technology
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KAMEI Toshihiro
National Institute of Advanced Industrial Science and Technology
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MORI Masahiko
National Institute of Advanced Industrial Science and Technology
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Mori Masahiko
National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan
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