Searching for Novel Ru-Based Thin Film Metallic Glass by Combinatorial Arc Plasma Deposition
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概要
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We found out a novel Ru–Zr–Al thin film metallic glass by combinatorial arc plasma deposition (CAPD). To search for Ru-based thin film metallic glasses, first, a library of 1,089 CAPD samples was deposited, of which fifteen amorphous samples were selected by X-ray diffractometry. The compositions of these samples were measured by energy dispersive X-ray fluorescence spectrometry. From the fifteen samples, two samples having low Al content (Ru65Zr30Al5 and Ru67Zr25Al8, at. %) were chosen, and their compositions were reproduced in samples deposited by sputtering, because the CAPD samples were too small for evaluating the glass transition temperature $T_{\text{g}}$ and crystallization temperature $T_{\text{x}}$ by differential scanning calorimetry (DSC). DSC revealed that the two sputter-deposited samples Ru65Zr30Al5 and Ru67Zr25Al8 had a supercooled liquid region (SCLR), showing a $T_{\text{g}}$, $T_{\text{x}}$, and width of SCLR $\Delta T_{\text{x}}$ ($=T_{\text{x}}-T_{\text{g}}$) of 902, 973, and 71 K in the case of Ru65Zr30Al5, and 913, 979, and 66 K in the case of Ru67Zr25Al8, respectively. Moreover, the sputter-deposited samples Ru65Zr30Al5 and Ru67Zr25Al8 exhibited superior mechanical properties. The fracture stress $\sigma_{\text{f}}$, elastic limit $\varepsilon_{\text{l}}$, and Young's modulus $E$ were 1.9 GPa, 2.0% and 92.7 GPa, respectively, for Ru65Zr30Al5 and 1.9 GPa, 2.0%, and 91.6 GPa, respectively, for Ru67Zr25Al8.
- 2007-04-15
著者
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SAKURAI Junpei
Precision and Intelligence Laboratory, Tokyo Institute of Technology
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YAMAUCHI Ryusuke
Precision and Intelligence Laboratory, Tokyo Institute of Technology
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Shimokohbe Akira
Precision & Intelligence Laboratory Tokyo Institute Of Technology
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Hata Seiichi
Frontier Collaborative Research Center Tokyo Institute Of Technology
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