Very High Rate and Uniform Glass Etching with HF/HCl Spray for Transferring Thin-Film Transistor Arrays to Flexible Substrates
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概要
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We report on very high rate and uniform glass etching with HF/HCl spray for transferring thin-film transistor (TFT) arrays from a glass substrate to a flexible substrate. Using HF/HCl spray etching, we achieved both high etch rates of over 20 μm/min and satisfactory etch-rate uniformity over a 150 mm$\square$ area with an approximately 5% variation. Using spray etching, we have successfully fabricated flexible TFT substrates that have satisfactory electrical characteristics.
- 2006-07-15
著者
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TAKECHI Kazushige
Technology Research Association for Advanced Display Materials (TRADIM)
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KANOH Hiroshi
SOG Research Laboratories, NEC Corp.
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OTSUKI Shigeyoshi
Technology Research Association for Advanced Display Materials (TRADIM)
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Kanoh Hiroshi
SOG Research Laboratories, NEC Corp., 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Otsuki Shigeyoshi
Technology Research Association for Advanced Display Materials (TRADIM), 24-16 Nakamachi 2-chome, Koganei, Tokyo 184-0012, Japan
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Takechi Kazushige
Technology Research Association for Advanced Display Materials (TRADIM), 24-16 Nakamachi 2-chome, Koganei, Tokyo 184-0012, Japan
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