Fast Growth of Carbon Nanowalls from Pure Methane using Helicon Plasma-Enhanced Chemical Vapor Deposition
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概要
- 論文の詳細を見る
Carbon nanowalls (CNWs) are synthesized under pure methane gas (CH4) using helicon plasma-enhanced chemical vapor deposition. CH4 in the helicon discharge is effectively dissociated to hydrogen atoms and hydrocarbon radicals, resulting in the formation of CNWs on a Ni substrate only from CH4. CNWs are grown up at a high growth rate of 18 μm/h.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2006-06-15
著者
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Sato Genta
Department Of Electronic Engineering Tohoku University
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Kato Toshiaki
Department Of Applied Chemistry School Of Engineering Tokai University
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Hatakeyama Rikizo
Department Of Electronic Engineering Tohoku University
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Sato Genta
Department of Electronic Engineering, Tohoku University, Sendai 980-8579, Japan
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Morio Tetsuharu
Department of Electronic Engineering, Tohoku University, Sendai 980-8579, Japan
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