Fabrication of High-Resolution Periodical Structure in Photoresist Polymers Using Laser Interference Technique
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概要
- 論文の詳細を見る
Periodical structures in the nanometer order, which are clearer and of superior aspect than those reported elsewhere, were fabricated. These structures were fabricated onto a positive-type photoresist film by a two-beam interference technique using a single-pulse Nd:YAG (355 nm) laser. A grating structure with a depth of more than 300 nm and period of 400 nm was formed, accompanied by wet development. Moreover, a 200-nm-period grating, which is close to the theoretical limit, was successfully fabricated with higher aspect.
- 2004-04-15
著者
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Sugihara Okihiro
Institute Of Multidisciplinary Research For Advanced Materials (imram) Tohoku University
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CHE Yanlong
Shizuoka University, NEDO Technical Fellow, Center for Joint Research
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OKAMOTO Naomichi
Graduate School of Electronic Science and Technology, Shizuoka University
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Shibata Shinya
Graduate School Of Electronic Science And Technology Shizuoka University
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Kaino Toshikuni
Institute For Chemical Reaction Science Tohoku University
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Shibata Shinya
Graduate School of Electronic Science and Technology, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8561, Japan
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Kaino Toshikuni
Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Okamoto Naomichi
Graduate School of Electronic Science and Technology, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8561, Japan
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Sugihara Okihiro
Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Che Yanlong
Shizuoka University, NEDO Technical Fellow, Center for Joint Research, 3-5-1 Johoku, Hamamatsu 432-8561, Japan
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