Fabrication of Isolated FePd Nanoparticles by Sputtering and Heat Treatment
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概要
- 論文の詳細を見る
In this paper, we describe the fabrication of two-dimensionally dispersed nanoparticles by sputtering and annealing. FePd has been chosen as the target material. As the first step of this process, ultrathin films were sputter-deposited on Si substrates. Subsequently, they were annealed at 450–800°C. As the result, numerous nanoparticles with a diameter of about 5 nm were formed on the substrate surface, when the thickness of the as-deposited film was approximately less than 3 nm.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 2003-05-15
著者
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Ichitsubo Tetsu
Graduate School Of Engineering Science Osaka Univ.
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Hirao Masahiko
Graduate School Of Engineering Sci. Osaka Univ.
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Ichitsubo Tetsu
Graduate School of Engineering Science, Osaka University, Toyonaka 560-8531, Japan
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Koujina Masayuki
Graduate School of Engineering Science, Osaka University, Toyonaka 560-8531, Japan
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Kawashima Masao
Graduate School of Engineering Science, Osaka University, Toyonaka 560-8531, Japan
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Hirao Masahiko
Graduate School of Engineering Science, Osaka University, Toyonaka 560-8531, Japan
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