Theoretical Analysis of Placement Error due to Absorber Pattern on Extreme Ultraviolet Lithography Mask

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概要

• 論文の詳細を見る

• The pattern placement accuracy of an extreme ultraviolet lithography (EUVL) mask strongly depends on the stresses present in the multilayer and absorber films, since film stress causes both out-of-plane and in-plane distortions. To analyze this elastic deformation, we have developed simulation models that handle the interaction between the multilayer and absorber patterns. The models are based on two-dimensional theories of bending plates and plane stress. The numerical calculations employ the finite difference method and the successive over-relaxation method. To examine the validity and accuracy of the models, the deformation of EUVL masks using simple absorber patterns was calculated. For the calculations, we assumed a standard 6 inch quartz substrate with a reflective coating. The influence of the absorber pattern on placement error was investigated by simulations, and it was found that the absorber pattern is the main factor determining the pattern placement accuracy of an EUVL mask.

• Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
• 2001-06-15

著者

• Chiba Akira

  Aset (association Of Super-advanced Electronics Technologies) Euv Process Technology Research Labora

• YAMANASHI Hiromasa

  ASET EUVL Laboratory

• HOKO Hiromasa

  ASET EUVL Laboratory

• OGAWA Tarou

  ASET EUVL Laboratory

• HOSHINO Eiichi

  ASET EUV Laboratory

• TAKAHASHI Masashi

  ASET EUV Laboratory

• LEE Byoung

  ASET EUV Laboratory

• ITO Masaaki

  ASET EUV Laboratory

• HIRANO Naoya

  ASET EUVL Laboratory

• OKAZAKI Sinji

  ASET EUVL Laboratory

• Lee Byoung

  ASET EUVL Laboratory, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan

• Hoshino Eiichi

  ASET EUVL Laboratory, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan

• Ogawa Tarou

  ASET EUVL Laboratory, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan

• Chiba Akira

  ASET EUVL Laboratory, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan

• Okazaki Sinji

  ASET EUVL Laboratory, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan

• Yamanashi Hiromasa

  ASET (Association of Super-Advanced Electronics Technologies), EUV Process Technology Research Laboratory, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan

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