Design of Phase-Shift Masks in Extreme Ultraviolet Lithography
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-05-15
著者
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Chiba Akira
Aset (association Of Super-advanced Electronics Technologies) Euv Process Technology Research Labora
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Nishiyama Iwao
Association Of Super-advanced Electronic Technologies Euv Process Technology Research Laboratory C/o
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CHIBA Akira
Association of Super-Advanced Electronics Technologies, Atsugi Research Center, c
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SUGAWARA Minoru
Association of Super-Advanced Electronics Technologies, Atsugi Research Center, c
関連論文
- Measurement of Temperature Rise of Quartz Plate during Synchrotron Radiation Irradiation Using Infrared Camera(Instrumentation, Measurement, and Fabrication Technology)
- Heat Sink Dependency of Mask In-Plane Displacement for Extreme Ultraviolet Lithography
- Assessment of Heat Deformation and Throughput for Selecting Mask Substrate Material for Extreme Ultraviolet Lithography
- Modeling of In-Plane Distortion of Extreme Ultraviolet Lithography Mask in Flat State
- Thermal In-Plane Distortion Model of Mask for Extreme Ultraviolet Lithography during Periodic Scanning Exposure
- Approach to Patterning of Extreme Ultraviolet Lithography Masks using Ru Buffer Layer : Surfaces, Interfaces, and Films
- Thermal Behavior along Depth of Extreme Ultraviolet Lithography Mask during Dry Etching : Surfaces, Interfaces, and Films
- Temperature Rise of Extreme Ultraviolet Lithography Mask Substrate during Dry Etching Process : Semiconductors
- Estimation of Extreme Ultraviolet Power and Throughput for Extreme Ultraviolet Lithography
- Theoretical Analysis of Placement Error due to Absorber Pattern on Extreme Ultraviolet Lithography Mask
- Analysis of Asymmetry of Printed Image by Off-Axis Incident Light onto Reflective Mask in Extreme Ultraviolet Lithography
- Mask Pattern Correction by Energy Loss Compensation in Extreme Ultraviolet Lithography
- Impact of Slanted Absorber Side Walls on Critical Dimension Error in Extreme Ultraviolet Lithography
- Design of Phase-Shift Masks in Extreme Ultraviolet Lithography
- Estimation of Mask Placement Error Caused by Multilayer Stress Profile
- Pattern Printability for Variation in Thickness of a Mo/Si Mask Blank in Extreme Ultraviolet Lithography
- Theoretical Analysis of Placement Error due to Absorber Pattern on Extreme Ultraviolet Lithography Mask
- Pattern Printability for Variation in Thickness of a Mo/Si Mask Blank in Extreme Ultraviolet Lithography
- Heat Sink Dependency of Mask In-Plane Displacement for Extreme Ultraviolet Lithography
- Measurement of Temperature Rise of Quartz Plate during Synchrotron Radiation Irradiation Using Infrared Camera
- Estimation of Extreme Ultraviolet Power and Throughput for Extreme Ultraviolet Lithography
- Estimation of Mask Placement Error Caused by Multilayer Stress Profile