Optical Disk Mastering Using Optical Superresolution Technique
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概要
- 論文の詳細を見る
A new laser lithography technique using the effect of optical superresolution can effectively reduce the exposed spot size on a photoresist layer, thus allowing disk mastering toward higher density using an existing light source and optics. A thin metallic mask layer deposited on the top of the photoresist layer is used to obtain a "below optical diffraction limit" linewidth on the photoresist layer. The feasibility of the laser lithography technique, as evaluated by simulation and experimental results, revealed that the linewidth on the photoresist layer could be shrunk by more than 50% of the diffraction limit of the optical system.
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 2001-03-30
著者
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Hsieh Tsung-eong
Department Of Materials Science And Engineering National Chiao Tung University
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Shieh Han-ping
Institute Of Electro-optic Engineering National Chiao Tung University
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Hsieh Tsung-Eong
Department of Materials Science and Engineering, National Chiao Tung University, Hsinchu, Taiwan 30010, R.O.C.
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Tsai Shih-Yaon
Institute of Electric-Optical Engineering, National Chiao Tung University, Hsinchu, Taiwan 30010, R.O.C.
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Peng Yi-Hsing
Institute of Electric-Optical Engineering, National Chiao Tung University, Hsinchu, Taiwan 30010, R.O.C.
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Shieh Han-Ping
Institute of Electric-Optical Engineering, National Chiao Tung University, Hsinchu, Taiwan 30010, R.O.C.
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Hsieh Tsung-Eong
Department of Material Science and Engineering, National Chiao Tung University, Hsinchu 300, Taiwan
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