Microlens Array Fabricated by Excimer Laser Micromachining with Gray-tone Photolithography
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概要
- 論文の詳細を見る
We demonstrate the fabrication of a refractive microlens array by using 248 nm excimer laser micromachining with coded gray-tone mask photolithography. With pre-corrections to the nonlinear exposure process, the maximum deviation from the designed shape was below 5%. The fabricated hemispherical lens of 30 μm radius was used as a solid immersion lens (SIL) and combined with a 0.54 numerical aperture ($\mathrm{NA}$) objective to achieve a 0.87 effective $\mathrm{NA}$ through the knife-edge scanning test. The experimental results agreed with those of the simulation. Unlike the methods such as the thermal melting process, this one-step optical exposure method with a coded mask provides a relatively fast and cost-effective way to realize a microlens array in optical data storage, information processing, and optical interconnection applications.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 2003-03-15
著者
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Chiu Yi
Institute Of Electro-optical Engineering National Chiao Tung University
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Tien Chung-hao
Institute Of Electro-optical Engineering National Chiao Tung University
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Chien Yeh-en
Institute Of Electro-optical Engineering National Chiao Tung University
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Shieh Han-Ping
Institute of Electric-Optical Engineering, National Chiao Tung University, Hsinchu, Taiwan 30010, R.O.C.
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Tien Chung-Hao
Institute of Electro-Optical Engineering, National Chiao Tung University, Hsinchu, Taiwan 30010, R.O.C.
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