Fabrication of Thin Film Optical Interference Filters for LCD Color Filters

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概要

• 論文の詳細を見る

• Issues in fabricating color filters with all-dielectric optical interference technique are studied. The color filters are constituted of multiple thin layers of SiO_2 and TiO_2 deposited alternatively to form bandpass or edge filters. Advantages of all-dielectric filters, such as high transmittance, low absorption, high color purity, and good color reproduction, are discussed and compared with dye-gelatin filters. Thickness variations of thin film layers have been analyzed to assess the optical tolerance on the fabrication of color filters using physical vapor depositions.

• 社団法人映像情報メディア学会の論文
• 1994-10-28

著者

• SHIEH Han-Ping

  Institute of Electro-Optical Engineering, National Chiao Tung University

• Shieh Han-ping

  Institute Of Electro-optical Engineering National Chiao Tung University

• Yoo Jinn-Chou

  Institute of Electro-Optocal Engineering, National Chiao Tung University

• Yoo Jinn-chou

  Institute Of Electro-optical Engineering National Chiao Tung University

• Chen Shin-Ming

  Institute of Electro-optical Engineering National Chiao Tung University

• Chen Szu-Fen

  Institute of Electro-optical Engineering National Chiao Tung University

• Chen Szu-fen

  Institute Of Electro-optical Engineering National Chiao Tung University:philips Electronics Industri

• Chen Shin-ming

  Institute Of Electro-optical Engineering National Chiao Tung University:taiwan Semiconductor Manufac

• Shieh Han-ping

  Institute Of Electro-optic Engineering National Chiao Tung University

• Shieh Han-Ping

  Institute of Electric-Optical Engineering, National Chiao Tung University, Hsinchu, Taiwan 30010, R.O.C.

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