Growth Rate Enhancement of $(000\bar{1})$-Face Silicon–Carbide Oxidation in Thin Oxide Regime

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概要

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• The thermal oxidation of silicon carbide (SiC) has been studied by performing in-situ ellipsometry. We have found that the oxidation rates at the oxidation thickness of approximately less than around 20 nm are much larger than those given using the Deal–Grove (D–G) model, suggesting that the oxidation time dependence of the oxide thickness cannot be explained using the D–G model, i.e., a simple linear-parabolic model, in the initial oxidation stage. By using the empirical relation, which has been proposed for Si oxidation, i.e., adding an exponential term to the D–G equation, the origin of the growth rate enhancement in SiC oxidation has been discussed.

• Japan Society of Applied Physicsの論文
• 2007-08-25

著者

• Yoshida Sadafumi

  Division Of Mathematics Electronics And Informatics Graduate School Of Science And Engineering Saita

• Hijikata Yasuto

  Division Of Mathematics Electronics And Informatics Graduate School Of Science And Engineering Saita

• Yamamoto Takeshi

  Division Of Cardiology Department Of Internal Medicine Nippon Medical School

• Yaguchi Hiroyuki

  Division Of Mathematics Electronics And Informatics Graduate School Of Science And Engineering Saitama University

• Yaguchi Hiroyuki

  Division of Mathematics, Electronics and Information, Graduate School of Science and Engineering, Saitama University, 255 Shimo-Okubo, Sakura-ku, Saitama 338-8570, Japan

• Yamamoto Takeshi

  Division of Mathematics, Electronics and Information, Graduate School of Science and Engineering, Saitama University, 255 Shimo-Okubo, Sakura-ku, Saitama 338-8570, Japan

• Yoshida Sadafumi

  Division of Mathematics, Electronics and Information, Graduate School of Science and Engineering, Saitama University, 255 Shimo-Okubo, Sakura-ku, Saitama 338-8570, Japan

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