Study of Inhibition Effect of BTA on Anodic Dissolution of Copper by Channel Flow Double Electrode in Acid Solution

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The inhibitory effect of BTA on the anodic dissolution of copper in an acid solution was studied using a channel flow double electrode. Electrochemical measurements obtained using channel flow double electrode enable the determination of dissolution currents of cuprous or cupric ions with the measurement of the potentiodynamic polarization curve. The diffusion-limiting current decreased remarkably in an acid solution containing BTA. Results show that the actions of BTA on the dissolution mechanisms of cuprous and cupric ions are different. Potential-pH diagrams were constructed and compared with the experimental data. CuCl and Cu(I)-BTA are in equilibrium at the forming potential of Cu(I)-BTA film. The decrease of the dissolution current of cuprous ions by the addition of BTA originates from the formation of Cu(I)-BTA film by reacting CuCl and BTA. Cupric ions dissolve at the noble potential in the presence of Cu(I)-BTA film on the copper surface. For the measurement of transient current at potentiostatic polarization, the time at which the initial current value becomes 1/10 was defined as the film formation time(t1/10), which was evaluated at various potentials. The competitive reactions of copper dissolution and Cu(I)-BTA film formation were investigated based on the potential dependence on t1/10.