Development of Tin Droplet Target for 13.5 nm Lithography
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概要
- 論文の詳細を見る
A new flow control method for a tin droplet generator in a vacuum has been developed for Extreme Ultra-Violet Lithography. A vibration rod forced by a piezoelectric crystal varies the flow resistance, thus changing the flow rate at a high repetition rate. This droplet generator is advantageous for high temperature liquids such as molten metal. The formation of tin droplets using this generator was demonstrated at a frequency range of 10 kHz to 22 kHz by a 100 m nozzle.
- 社団法人 プラズマ・核融合学会の論文
著者
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Fujiwara Etsuo
Department Of Electric Engineering Himeji Institute Of Technology
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NISHIMURA Hiroaki
Institute of Laser Engineering, Osaka University
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Yatsuzuka Mitsuyasu
Department Af Electric Engineering Himeji Institute Of Technology
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Sugishita Hiroki
Department of Electrical Engineering and Computer Sciences, University of Hyogo, Himeji, Hyogo 671-2280, Japan
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Nishimura Hiroaki
Institute of Laser Engineering (ILE), Osaka University, 2-6 Yamada-oka, Suita, Osaka 565-0871, Japan
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OKABE Yasuhiro
Department of Electrical Engineering and Computer Sciences, University of Hyogo
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SUGISHITA Hiroki
Department of Electrical Engineering and Computer Sciences, University of Hyogo
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YATSUZUKA Mitsuyasu
Department of Electrical Engineering and Computer Sciences, University of Hyogo
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