Effect of Adsorbed Matter on Intense Pulsed Ion Beam Generation
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概要
- 論文の詳細を見る
Generation of intense pulsed ion beams with high purity has been studied experimentally. Impurity ions in the ion beams were found to be caused by adsorbed matter on the anode and residual gas molecules in the diode chamber. The first few shots without breaking vacuum in the diode chamber were found to be effective to remove the adsorbed matter on the anode, and lead to higher purity of the ion beams. No effect on the ion beam current was observed upon changing the residual gas pressure in the range from 10^<-2> to 10^<-3> Pa or upon leaving the anode in atmosphere for 〜10 h. Residual gas molecules in the diode chamber had little effect on the purity of the ion beams. After the first 5 shots, the current of the ion beams was found to be 3.0 kA. The most dominant species in the ion beams was F^<2+>
- 社団法人応用物理学会の論文
- 1993-10-15
著者
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HASHIMOTO Yoshiyuki
Department of Hygienic Chemistry, Pharmaceutical Institute, Tohoku University
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Hashimoto Y
Department Of Electrical And Electronic Engineering Faculty Of Engineering Shinshu University
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Nobuhara Sadao
Department Of Electrical Engineering Faculty Of Engineering Himeji Institute Of Technology
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Yatsuzuka M
Department Of Electric Engineering Himeji Institute Of Technology
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Yatsuzuka Mitsuyasu
Department Af Electric Engineering Himeji Institute Of Technology
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Hashimoto Yoshiyuki
Departments Of Hygienic Chemistry Pharmaceutical Institute Tohoku University
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Hashimoto Yoshiyuki
Department Of Hygienic Chemistry Faculty Of Pharmaceutical Sciences Tohoku University
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