Stability of an Intense Pulsed Ion Beam during Successive Operation
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概要
- 論文の詳細を見る
Stability of an intense pulsed ion beam during successive operation was studied experimentally with an inverse pinch ion diode. When an anode of metals or plastics is used for an ion source, the diode impedance and ion beam current were changed with every shot of operation. In the case of a copper anode, the ion current at 10 shots was reduced to one-half or one-third that at the first shot. Using a soda-lime glass (Na_2O・CaO・5SiO_2), on the surface of which vacuum oil or Aquadag was coated as the ion source, the diode impedance and the ion current remained constant for 20-30 shots. With the vacuum oil ion source, the most dominant species of the ion beam was C^<3+>, which has energy in the range of 150-200 keV. The current density of the ion beam at 120 mm behind the anode was about 100 A/cm^2.
- 社団法人応用物理学会の論文
- 1994-09-15
著者
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HASHIMOTO Yoshiyuki
Department of Hygienic Chemistry, Pharmaceutical Institute, Tohoku University
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Hashimoto Y
Department Of Electrical And Electronic Engineering Faculty Of Engineering Shinshu University
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Nobuhara Sadao
Department Of Electrical Engineering Faculty Of Engineering Himeji Institute Of Technology
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Yatsuzuka M
Department Of Electric Engineering Himeji Institute Of Technology
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Yatsuzuka Mitsuyasu
Department Af Electric Engineering Himeji Institute Of Technology
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Hashimoto Yoshiyuki
Departments Of Hygienic Chemistry Pharmaceutical Institute Tohoku University
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Hashimoto Yoshiyuki
Department Of Hygienic Chemistry Faculty Of Pharmaceutical Sciences Tohoku University
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