C12 微細パターニングのためのダイレクトインプリント技術の開発(OS-12 ナノ加工と表面機能(3))

概要

論文の詳細を見る
In order to fabricate fine patterns with feature sizes from several to several tens of μm, we have been developing a novel direct imprmt lithography technique. In this technique, fluorine-containing polymer (C8FA) patterns, which has good water repellency, are imprinted directly onto a Culpolyimide substrate using an elastomeric stamp (PDMS) followed by the etching of the Cu thm film with the transferred polymer mask. Dynamic observations of imprinting process revealed that various contact behaviors of the PDMS stamp have contributed to the different defects of Cu line patterns. In addition, it was found that a significant improvement in our proposed direct imprint lithography technique can be expected by improving the flatness of the stamp surface.
一般社団法人日本機械学会の論文
2008-11-21