C11 マイクロニードルアレイを用いたマスクレス微細パターニング技術の開発 : 微細めっきパターン形成のための基礎的検討(OS-12 ナノ加工と表面機能(3))

概要

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In order to develop a novel maskless patterning technique that is based on an electroplating method with an array of hollow silicon dioxide (SiO_2) microneedles, preliminary water ejection tests were conducted by employing fabricated microneedles with inner diameters ranging from 1.6μm to 16.0μm. A remarkable increase in ejection pressure was observed by employing microneedles with an inner diameter of 1.6μm. The resulting ejection pressure was found to be approximately equal to the theoretical pressure difference at the liquid-air interface of a water droplet formed at the needle tip that is subject to the Young-Laplace equation. Moreover, the effect of electrostatic force on ejection pressure was investigated. The results revealed that the ejection pressure was inversely proportional to electric field strength, indicating that smaller ejection pressure is required at larger applied voltage and/or smaller distance between the needle tip and a substrate.
社団法人日本機械学会の論文
2008-11-21