Constriction resistance analysis of multi-contact spots
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概要
- 論文の詳細を見る
Many researchers have studied influences of contact shape, plating conditions, and surface roughness on constriction resistance at a contact point. However, detail research to know how constriction resistance of the apparent contact area depends on the distribution status of the real contact points and on the total real contact area has not been performed. In our study, therefore, constriction resistance is calculated by numerical analysis using Laplace's equations for electric potential in the steady state in many cases of contact spot dispersion status. The results show that the apparent contact resistance with only 15% real contact area does not increase beyond 1.5 times of the real contact resistance. Therefore, it is proven that contact resistance can be practically calculated using the apparent contact area instead of the real contact area.
- 社団法人電子情報通信学会の論文
- 2009-11-12
著者
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Sawada Shigeru
Mie Univ. Tsu‐shi Jpn
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HATTORI Yasuhiro
AutoNetworks Technologies, Ltd.
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HATTORI Yasuhiro
Circuits and Connection R&D Division, AutoNetworks Technologies, Ltd.
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TAMAI Terutaka
Graduate School of Engineering, Mie University
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IIDA Kazuo
Graduate School of Engineering, Mie University
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SAWADA Shigeru
Graduate School of Engineering, Mie University
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Iida Kazuo
Graduate School Of Engineering Mie University
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Tamai Terutaka
Mie Univ.
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Hattori Yasuhiro
Autonetworks Tech.
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Hattori Yasuhiro
Circuits And Connection R&d Division Autonetworks Technologies Ltd.
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