Photoresponse of Plasma Sprayed TiO_2-Rutile Semiconductor(Physics, Process, Instruments & Measurements)

概要

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Plasma spraying has been used to prepare n-type polycrystalline TiO_2 coatings on titanium. Photoelecrero-chemical properties of the plasma sprayed TiO_2 (rutile) coating photoanodes were measured in oxygen-saturated aqueous solution of 0.1N NaOH. The photoresponse of plasma sprayed TiO_2 coatings have been studied and compared with air oxdized films of titanium. The photoresponse of the plasma sprayed TiO_2 coating photoanodes to band and subband gap energies were explored as a function of wavelength and intensity of monochromatic light, applied potential and adititive in coatings. The photoresponse was shown to increase linearly with light intensity, and to depend on the square root of applied potential. These results suggest a bulk photoexcitation process involving impurity and defect levels in the energy gap of semiconductor plasma sprayed TiO_2 (rutile) coatings. A qualitative model was presented to account for the main features of this exitation process.
大阪大学の論文