レーザーアブレーション法を用いて(001),(110)および(111)SrTiO_3基板上にエピタキシャル成長させたCaRuO_3薄膜の微細構造と電気伝導度(秋季シンポジウム若手研究者論文)

概要

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CaRuO_3 (CRO) thin films were prepared on SrTiO_3 (STO) single-crystal substrates by laser ablation, and their microstructures and the effect of lattice misfit on electrical conductivity were investigated. Pseudo-cubic (001), (110) and (111) oriented CRO thin films were grown epitaxially with the in-plane relationships on (001), (110) and (111) STO substrates at an oxygen pressure of 13 Pa and a substrate temperature of 973K, respectively. Epitaxial (001) thin films showed a flat and smooth surface with a terrace and step structure whereas (110) CRO thin film had a faceted pyramid-like structure. The (111) CRO thin film had a rough terrace and step structure with trigonal texture. The lattice expansion of CRO would cause the decrease of the electrical conductivity. Epitaxial (111) CRO thin films has good lattice consistency with (111) STO substrate, and exhibited the highest electrical conductivity of 1.5×10^5 S・m^<-1> among the (001), (110) and (111) CRO thin films.
社団法人日本セラミックス協会の論文
2007-11-01