プラズマCVD法による歯科金属材料へのTiO_2コーティング

概要

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In this study, TiO2 films were prepared on Ag-Pd alloys by Plasma-enhanced Chemical Vapor Deposition (PECVD) using Ti(O-i-Pr)2(dpm)2 precursor. Ag-Pd alloys are widely used as a substrate material of a resin-veneered dental crown. Since an adhesion of a dental resin to the Ag-Pd alloy substrate is poor, protuberances are usually formed on the substrate surface to sustain the mechanical retention. One of the weak points in the resin-veneered dental crown is that a mechanical retention should be indispensable to fix the resin onto the metal frame. Instead of mechanical retention, TiO2 films were prepared on the substrates.The effects of the deposition conditions on the crystalline phases, microstructures, and color of the deposited films were investigated. As a result, at a substrate pre-heating temperature Tdep=500°C, microwave power PM=2 kW, deposition pressure Ptot=0.4 or 0.7 kPa, the film color changed from black to white, and crystalline phase was anatase. And the microstructure of the film was granular. The grain size was a diameter of about 100 nm. These are optimum deposition conditions.
社団法人粉体粉末冶金協会の論文
2008-05-15