大気TPCVDによる光触媒酸化チタン薄膜の高速合成

概要

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In order to obtain some useful information on rapid process for functional film deposition, TiO_2 film deposition by thermal plasma chemical vapor deposition (TPCVD) method under an atmospheric environment was carried out. The experiment was conducted under the condition where working gas was Ar, working gas flow rate was 201/min, spraying distance was varied from 10 to 60mm and spraying time was 5 min. Titanium tetra buthoxide was used for the starting material. According to the XRD profiles, the TiO_2 films formed by TPCVD contained peaks of rutile-type and anatase-type. The results of wettability and methylene blue decoloration tests suggest that the TiO_2 films have good photocatalytic properties as the spraying distance is short. It is concluded that the proposed highly promising for rapid functional thin film formation.
一般社団法人日本機械学会の論文
2005-03-25