Focused Ion Beam Process for Formation of a Metal/Insulator/Metal Double Tunnel Junction
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概要
- 論文の詳細を見る
An improved method to fabricate a small lateral double tunnel junction which utilizes focused ion beam (FIB) etching and lift-off techniques is proposed. A double layer resist consisting of nitrocellulose and germanium layers was used. Narrow grooves with widths comparable to or narrower than the FIB diameter were formed in a ferromagnetic layer of Ni, and Ni/Ni-oxide/Au/Ni-oxide/Ni and Al/Al-oxide/Ni/Al-oxide/Al double junction structures were fabricated using the proposed method. The measured voltage and current characteristics of the latter structures indicated that double tunnel junctions with a barrier height of 0.61 eV were fabricated and suggest that this is a promising method to fabricate island structures for devices utilizing Coulomb blockade or spin blockade effects.
- 社団法人応用物理学会の論文
- 1999-12-30
著者
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蒲生 健次
阪大院基礎工
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若家 冨士男
Osaka Univ. Osaka
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蒲生 健二
阪大基礎工
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蒲生 健次
大阪大学基礎工学部
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GAMO Kenji
Department of Electrical Engineering,Faculty of Engineering Sciences,Osaka University
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蒲生 健次
大阪大学基礎工学部電気工学科
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Junichi Yanagisawa
Department Of Physical Science Graduate School Of Engineering Science Osaka University:research Cent
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Gamo K
Osaka Univ. Osaka
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Gamo Kenji
Graduate School Of Engineering Science Osaka University
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Gamo Kenji
Department Of Electrical Engineering Faculty Of Engineering Science Osaka University
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Gamo Kenji
Department Of Physical Science Graduate School Of Engineering Science Osaka University:research Cent
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WAKAYA Fujio
Department of Electronics and Materials Physics, School of Engineering Science, Osaka University
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YANAGISAWA Junichi
Department of Physical Science, Graduate School of Engineering Science, Osaka University
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NAKAYAMA Masayoshi
Department of Agricultural Chemistry, The University
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Wakaya Fujio
Department Of Electronics And Materials Physics School Of Engineering Science Osaka University
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Yanagisawa Junichi
Department Of Electrical Engineering Faculty Of Engineering Science Osaka University
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Nakayama M
Ntt Network Innovation Lab. Yokosuka‐shi Jpn
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Wakaya Fujio
Department of Electrical Engineering, Osaka University, Toyonaka, Osaka 560
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