Characteristic Change due to Argon Ion Etching and Heat Treatment of (Pb, La)TiO_3 Thin Films Fabricated by Multiple Cathode Sputtering

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1995-09-30

著者

• Hiroshi Maiwa

  Department Of Materials Science And Engineering Shonan Institute Of Technology

• Ichinose N

  Waseda Univ. Tokyo Jpn

• Ichinose Noboru

  Department Of Materials Science And Engineering School Of Science And Engineering Waseda University

• Ichinose Noboru

  Toshiba Research Consulting Corporation

• Ichinose Noboru

  School Science And Engineering Waseda University

• MAIWA Hiroshi

  Department of Materials Science and Engineering, Shonan Institute of Technology

• OKAZAKI Kiyoshi

  Department of Materials Science and Ceramic Technology, Faculty of Engineering, Shonan Institute of

• Okazaki K

  Department Of Materials Science And Ceramic Technology Faculty Of Engineering Shonan Institute Of Te

• Okazaki Kiyoshi

  Department Of Electrical Engineering The Natinal Defense Academy

• Maiwa Hiroshi

  Department of Human and Environmental Science, Shonan Institute of Technology, 1-1-25 Tsujido Nishikaigan, Fujisawa, Kanagawa 251-8511, Japan

• Okazaki Kiyoshi

  Department of Applied Physics, Tokyo Institute of Technology

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