Low Dielectric Constant Insulator Formed by Downstream Plasma CVD at Room Temperature Using TMS/O_2

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1997-03-30

著者

• ITOH Hisayoshi

  Japan Atomic Energy Research Institute

• Itoh Haruo

  Chiba Institute Of Technology

• Itoh H

  Chiba Institute Of Technology

• Nara Akiko

  Ulsi Research Laboratories Toshiba Corporation

• ITOH Hitoshi

  ULSI Research Center, Toshiba Corp.

• Itoh Hitoshi

  Ulsi Research Center Toshiba Corp.

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• Low Dielectric Constant Insulator by Downstream Plasma CVD at Room Temperature Using Si(CH_3)_4/O_2
• Low Dielectric Constant Insulator Formed by Downstream Plasma CVD at Room Temperature Using TMS/O_2

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