Appropriate Pulling Axis Orientation to Suppress Slip Dislocation Generation during Czochralski Growth of Semiconductor Crystals : Condensed Matter
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概要
- 論文の詳細を見る
The pulling axis orientation effect on dislocation density reduction is considered, based on the Schmid factor calculation under a uniform tangential stress field. The maximum Schmid factor converges at the 0.4536 value at <110> orientation. The <110> pulling axis is the best orientation to suppress slip dislocation generation. The feature of slip dislocation in a (110) wafer is also clarified from the calculation.
- 社団法人応用物理学会の論文
- 1988-05-20
著者
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Matsui Junji
Fundamental Research Laboratories, NEC Corporation
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KITANO Tomohisa
Fundamental Research Laboratories, NEC Corporation
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Kitano Tomohisa
Fundamental Reseach Laboratories Nec Corporation
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Matsui Junji
Fundamental Research Laboratories Nec Corporation
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