Amphoteric Doping in Si-Implanted Undoped or In-Doped Czochralski GaAs
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概要
- 論文の詳細を見る
We have studied the conditions causing amphoteric doping in Si-implanted Czochralski GaAs by photoluminescence and Hall effect measurements. Wafers of either undoped or In-doped GaAs were implanted and capped with either SiN_x or SiO_x before the activation anneal. Localized, strong amphoteric doping was observed only in SIN_x capped In-doped wafers. In all other annealed wafers only donor activity was detected. This effect is explained by the point defect reactions due to the presence of In and the interaction of the GaAs with the capping material during annealing.
- 社団法人応用物理学会の論文
- 1987-08-20
著者
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ONO Haruhiko
Fundamental Research Laboratories, NEC Corporation
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Ono Haruhiko
Fundamental Research Laboratories Nec Corporation
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Matsui Junji
Fundamental Research Laboratories Nec Corporation
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Kuzuhara Masaaki
Microelectronics Research Laboratories Nec Corporation
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WARWICK Colin
Fundamental Research Laboratories, NEC Corporation
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Warwick Colin
Fundamental Research Laboratories Nec Corporation:royal Signals And Radar Establishment
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- Amphoteric Doping in Si-Implanted Undoped or In-Doped Czochralski GaAs