Reducing the Thermal Budget of Solid Phase Crystallization of Amorphous Si Film Using Si_<0.47>Ge_<0.53> Seed Layer
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-08-15
著者
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KIM Tae-Hoon
Department of Electronic Engineering, Changwon National University
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KIM Tae-Hoon
Faculty of Pharmaceutical Sciences, Okayama University
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Kim T‐h
Seoul National Univ. Seoul Kor
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Hwang Chang-won
Lcd 3 Samsung Electronics Co. Ltd.
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Kim K‐b
Seoul National Univ. Seoul Kor
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Kim Ki-bum
Division Of Materials Science And Engineering Seoul National University
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Kim J‐w
Hoseo Univ. Chungnam Kor
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Kim Ki-bum
Research Institute Of Advanced Materials School Of Materials Science And Engineering Seoul National
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Kim Tae-hoon
Department Of Dermatology School Of Medicine Kyungpook National University
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RYU Myung-Kwan
Division of Materials Science and Engineering, Seoul National University
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RYU Myung-Kwan
Department of Metallurgical Engineering, Seoul National University
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KIM Jin-Won
Department of Metallurgical Engineering, Seoul National University
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KIM Ki-Bum
Department of Metallurgical Engineering, Seoul National University
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HWANG Chang-Won
Special Division, Samsung Electronics Co., Ltd.
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Kim Jin-won
Process Development Team Semiconductor R&d Center Samsung Electronics Co. Ltd.
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Kim Jin-won
Department Of Metallurgical Engineering Seoul National University
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Kim Jin-won
Department Of Environmental Horticulture University Of Seoul
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Ryu Myung-kwan
Division Of Materials Science And Engineering Seoul National University
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Kim Ki-Bum
Department of Materials Science and Engineering, Seoul National University, Seoul 151-742, Korea
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