Laser-Diode-Quality InP/Si Grown by Hydride Vapor Phase Epitaxy
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-06-01
著者
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KADOTA Yoshiaki
NTT Opto-electronics Laboratories
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Tachikawa Masami
Ntt Opto-electronics Laboratories
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Mori Hidefumi
NTT Opto-electronics Laboratories
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YAMADA Takeshi
NTT Opto-electronics Laboratories
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SASAKI Tohru
NTT Opto-electronics Laboratories
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- Laser-Diode-Quality InP/Si Grown by Hydride Vapor Phase Epitaxy
- InP Layer Grown on (001) Silicon Substrate by Epitaxial Lateral Overgrowth
- Ar Ion Laser-Assisted Metalorganic Molecular Beam Epitaxy of InGaAsP
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- Low-Threshold InGaAs/ InGaAsP Multiple Quantum Well Lasers Grown by Chemical Beam Epitaxy
- Selective Area Growth of InP and InGaAs Layers on SiO_2-Masked Substrate by Chemical Beam Epitaxy
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- Ar Ion Laser-Assisted Metalorganic Molecular Beam Epitaxy of InGaAs
- Ar Ion Laser-Assisted Metalorganic Molecular Beam Epitaxy of InP
- Mechanism of GaAs Selective Growth in Ar^+ Laser-Assited Metalorganic Molecular Beam Epitaxy
- Continuous GaAs Film Growth on Epitaxial Si Surface in Initial Stage of GaAs/Si Heteroepitaxy
- 1.5 μm-Long-Wavelength Multiple Quantum Well Laser on a Si Substrate
- Single Transverse Mode Microcavity Laser with Ultralow Threshold
- Laser-Assisted MOMBE Growth of GaAs Using Tri-Isobutyl Gallium
- Novel Selective Growth Using a Native Oxide on a (110) Cleaved Plane of AlGaAs/GaAs Superlattice