Characteristics of TiN Films Sputtered under Optimized Conditions of Metallic Mode Deposition

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1997-02-15

著者

• KISHIDA Satoru

  Department of Electronics, Faculty of Engineering, Tottori University

• TOKUTAKA Heizo

  Department of Electronics, Faculty of Engineering, Tottori University

• Kishida S

  Opto-electronics Research Laboratories Nec Corporation

• Kishida Satoru

  Department Of Electrical And Electronic Engineering Faculty Of Engineering Tottori University

• Tokutaka Heizo

  Department Of Electrical And Electronic Engineering Faculty Of Engineering Tottori University

• ITO Naohiko

  Department of Molecular and Laboratory Medicine, Mie University Graduate School of Medicine

• Ito Naohiko

  Department Of Electrical And Electronic Engineering Tottori University

• Masuya Haruko

  Center For Materials Analysis Research Center Sony Corp.

• Taguchi Mitsuru

  Mos Process Department Semiconductor Company Sony Corp.

• SUMI Hirofumi

  MOS Process Department, Semiconductor Company, Sony Corp.

• INOUE Hajime

  MOS Process Department, Semiconductor Company, Sony Corp.

• SUGANO Yukiyasu

  MOS Process Department, Semiconductor Company, Sony Corp.

• MASUYA Haruko

  Center for Materials Analysis, Research Center, Sony Corp.

• TAGUCHI Mitsuru

  MOS Process Department, Semiconductor Company, Sony Corp.

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