Kishida S | Opto-electronics Research Laboratories Nec Corporation
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概要
関連著者
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Kishida S
Opto-electronics Research Laboratories Nec Corporation
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KISHIDA Satoru
Department of Electronics, Faculty of Engineering, Tottori University
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TOKUTAKA Heizo
Department of Electronics, Faculty of Engineering, Tottori University
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Kishida Satoru
Department Of Electrical And Electronic Engineering Faculty Of Engineering Tottori University
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Tokutaka Heizo
Department Of Electrical And Electronic Engineering Faculty Of Engineering Tottori University
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Tokutaka H
Tottori Univ. Tottori Jpn
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Tokutaka Heizo
Som Japan Inc.
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NISHIMORI Katsumi
Department of Electronics, Faculty of Engineering, Tottori University
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ISHIHARA Naganori
Department of Electronics, Faculty of Engineering, Tottori University
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Ishihara N
Department Of Electrical And Electronic Engineering Faculty Of Engineering Tottori University
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Ishihara Naganori
Department Of Electronics Faculty Of Engineering Tottori University
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Nishimori K
Tottori Univ. Tottori Jpn
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Ishihara Naganori
Department Of Electrical And Electronic Engineering Faculty Of Engineering Tottori University
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NISHIMORI Katsumi
Department of Electrical and Electronic Engineering, Faculty of Engineering, Tottori University
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Fujimoto H
Daido Inst. Technol. Nagoya Jpn
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渡部 行男
九大院理
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渡辺 征夫
九州大学
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Watanabe Yoshihide
Department Of Electronics Faculty Of Engineering Tottori University
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FUJIMOTO Hiroshi
Department of Electronics, Faculty of Engineering, Tottori University
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FUJIMURA Kikuo
Department of Electrical and Electronic Engineering, Tottori University
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Fujimura Kikuo
Department Of Electrical And Electronic Engineering Tottori University
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Fujimoto Hiroshi
Department Of Applied Electronics Daido Institute Of Technology
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Fujimoto Hiroshi
Department of Advanced Energy, Graduate School of Frontier Sciences, The University of Tokyo
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NAKANISHI Shigemitsu
Department of Materials Science, University of Osaka Prefecture
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FUTO Wataru
Department of Electronics, Faculty of Engineering, Tottori University
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NOISHIKI Yoshio
Department of Electronics, Faculty of Engineering, Tottori University
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Noishiki Yoshio
Department Of Electronics Faculty Of Engineering Tottori University
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Futo Wataru
Department Of Electrical And Electronic Engineering Tottori University
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Nakanishi S
Univ. Tokyo Jpn
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NAKANISHI Shuuichi
Department of Electronics, Faculty of Engineering, Tottori University
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Kishida Shunji
Opto-electronics Research Laboratories Nec Corporation:(present Address)analysis And Evaluation Tech
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MARUYAMA Takafumi
Department of Environmental Science and Technology, Faculty of Engineering, Shinshu University
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TANABE Hiroyoshi
Opto-Electronics Research Laboratories
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Maruyama Takafumi
Department Of Electrical And Electronic Engineering Tottori University
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HARADA Kanji
Department of Electrical Engineering, Tsuyama National College of Technology
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Tanaka A
Department Of Applied Science For Electronics And Materials Graduate School Of Engineering Science
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YUMOTO Takashi
Department of Electrical and Electronic Engineering, Faculty of Engineering, Tottori University
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Ogura Y
Nec Corp. Kanagawa Jpn
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OGURA Yukio
Opto-Electronics Laboratories, NEC Corporation
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TANAKA Akito
Department of Dermatology, Kagoshima University Faculty of Medicine
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MATSUOKA Takeru
Department of Electrical and Electronic Engineering, Tottori University
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SUMI Hirofumi
MOS LSI Division, Semiconductor Company, Sony Corp.
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YANAGIDA Toshiharu
MOS LSI Division, Semiconductor Company, Sony Corp.
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SUGANO Yukiyasu
MOS LSI Division, Semiconductor Company, Sony Corp.
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Tanabe Hiroyoshi
Opto-electronics Laboratories Nec Corporation
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Sumi Hirofumi
Mos Lsi Division Semiconductor Company Sony Corp.
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Tanaka Akito
Department Of Dermatology Kagoshima University Faculty Of Medicine
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Sugano Yukiyasu
Mos Lsi Division Semiconductor Company Sony Corp.
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Yamamoto T
Department Of Applied Chemistry Faculty Of Science And Engineering Kinki University
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Yanagida Toshiharu
Mos Lsi Division Semiconductor Company Sony Corp.
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Yumoto Takashi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Tottori University
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Ogura Yukio
Opto-electronics Laboratories Nec Corporation
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KAWAI Tomoji
The Institute of Scientific and Industrial Research, Osaka University
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TORIGOE Seiji
Department of Electronics, Faculty of Engineering, Tottori University
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HARADA Hisamochi
Department of Electronics, Faculty of Engineering, Tottori University
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YAMAMOTO Takayuki
Department of Electronics, Faculty of Engineering, Tottori University
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KATAYAMA Makoto
Department of Neurosurgery, School of Medicine, Keio University
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Kawai Tomoji
The Institute Of Science And Industrial Research (isir-sanken) Osaka University
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Kishida Satoru
Department Of Electrical And Electronic Engineering Tottori University
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Tokutaka Heizo
Department Of Electrical And Electronic Engineering Tottori University
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YAMAUCHI Yasuhiro
Department of Physics,Kyoto University
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ITO Naohiko
Department of Molecular and Laboratory Medicine, Mie University Graduate School of Medicine
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USHIODA Jun
Opto-Electronics Research Laboratories
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KINOSHITA Hideki
Department of Chemical Science, Graduate School of Natural Science and Technology, Kanazawa Universi
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Kinoshita Hideki
Department Of Electrical And Electronic Engineering Tottori University
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Kinoshita Hideki
Department Of Bioscience And Biotechnology Faculty Of Agriculture Shinshu University:united Graduate
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Ushioda J
Opto‐electronics Res. Lab. Kawasaki Jpn
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Ito Naohiko
Department Of Electrical And Electronic Engineering Tottori University
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Masuya Haruko
Center For Materials Analysis Research Center Sony Corp.
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Toda Fumihiko
Oki Electric Industry Co. Ltd.
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Katayama Makoto
Department Of Electrical And Electronic Engineering Faculty Of Engineering Tottori University
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Torigoe Seiji
Department Of Electronics Faculty Of Engineering Tottori University
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NAKANISHI Syuuichi
Department of Electronics, Faculty of Engineering, Tottori University
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FIJIMOTO Hiroshi
Department of Electronics, Faculty of Engineering, Tottori University
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SHIBASAKI Atsuhiko
Department of Electrical and Electronic Engineering, Tottori University
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Taguchi Mitsuru
Mos Process Department Semiconductor Company Sony Corp.
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TAKABUCHI Takuei
Department of Electrical and Electronic Engineering, Faculty of Engineering, Tottori University
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TODA Fumihiko
Department of Electrical and Electronic Engineering, Faculty of Engineering, Tottori University
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YAMADA Tomoyuki
Oki Electric Industry Co., Ltd.
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SUMI Hirofumi
MOS Process Department, Semiconductor Company, Sony Corp.
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INOUE Hajime
MOS Process Department, Semiconductor Company, Sony Corp.
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SUGANO Yukiyasu
MOS Process Department, Semiconductor Company, Sony Corp.
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KOYANAGI Tsuyoshi
Faculty of Engineering, Yamaguchi University
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FUJII Takamichi
Kansai Research Institute, Kyoto Research Park
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IKEDA Yuji
Center for Materials Analysis, Research Center, Sony Corp.
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SASSERATH Jay
Materials Research Corp.
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YAMADA Hiroshi
MOS LSI Division, Semiconductor Company, Sony Corp.
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MIYAMORI Yuichi
MOS LSI Division, Semiconductor Company, Sony Corp.
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INUI Hirotomo
ULSI Device Development Laboratories, NEC Corporation
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IWABUCHI Yohko
Opto-Electronics Research Laboratories, NEC Corporation
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Inui Hirotomo
Ulsi Device Development Laboratories Nec Corporation
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Iwabuchi Y
Fuji Photo Film Co. Ltd. Kanagawa
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Toda Fumihiko
Department Of Electrical And Electronic Engineering Faculty Of Engineering Tottori University
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Yamauchi Y
Department Of Electrical And Electronic Engineering Tottori University
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Yamauchi Yasuhiro
Department Of Applied Chemistry Kansai University
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Koyanagi Tsuyoshi
Faculty Of Engineering Yamaguchi University
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Takabuchi Takuei
Department Of Electrical And Electronic Engineering Faculty Of Engineering Tottori University
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Harada Hisamochi
Department Of Electronics Faculty Of Engineering Tottori University
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Fujii Takamichi
Kansai Research Institute Kyoto Research Park
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Shibasaki Atsuhiko
Department Of Electrical And Electronic Engineering Tottori University
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Ikeda Yuji
Center For Materials Analysis Research Center Sony Corp.
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Yamamoto Takayuki
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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Yamauchi Yasuhiro
Department Of Anesthesiology Ehime National Hospital
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Miyamori Yuichi
Mos Lsi Division Semiconductor Company Sony Corp.
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Yamada Hiroshi
Mos Lsi Division Semiconductor Company Sony Corp.
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MASUYA Haruko
Center for Materials Analysis, Research Center, Sony Corp.
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YAMAMOTO Takayuki
Department of Communications and Integrated Systems, Tokyo Institute of Technology
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Katayama Makoto
Department of Chemistry, Faculty of Science and Technology, Sophia University
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TAGUCHI Mitsuru
MOS Process Department, Semiconductor Company, Sony Corp.
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Yamamoto Takayuki
Department of Applied Chemistry, Faculty of Science and Engineering, Kinki University
著作論文
- XPS Studies of Bi-Sr-Ca-Cu-O Single Crystal and Ceramics Surfaces
- Surface Analysis of YBa_2Cu_3O_x and Bi-Sr-Ca-Cu-O Superconductors by Auger Electron Spectroscopy
- Effects of Water on the Resistance-Temperature Characteristics of YBa_2Cu_3O_ Oxides : Electrical Properties of Condensed Matter
- Effects of Preparation conditions and Mechanical Polishing on the Superconducting Behavior of High-T_c Oxide Y_1Ba_2Cu_3O_
- Crystal Growth of Bi-Sr-Ca-Cu-O (c_0=39Å) Single Crystals
- Off-Angle SiC(0001) Surface and Cu/SiC Interface Reaction
- LEED-AES and XPS Studies of Bi-Sr-Ca-Cu-O Single Crystal Surfaces
- Surface of Bi_2Sr_2CaCu_2O_y Single Crystals Heated in Air
- Growth of Bi_2Sr_2CaCu_2O_y Single Crystals Using a Vertical Bridgmam Method
- X-Ray Photoelectron Spectroscopy Studies of 7 K-Phase Bi-System Single Crystals
- The Comparison of the Background Removal Methods in XPS Spectra
- XPS Studies of 80 K-Phase Bi-Sr-Ca-Cu-O Single Crystals
- LEED-AES Observations of 7 K- and 80 K-phase Bi-Sr-Ca-Cu-O Single Crystals
- X-Ray Photoelectron Spectroscopy Study of Junction Interface in In/BaRbBiO Films
- Characteristics of TiN Films Sputtered under Optimized Conditions of Metallic Mode Deposition
- Effect of O^+_2 and O^+ on the Growth of Bi_2Sr_2Ca_Cu_nO_y Superconductimg Films in RF Magnetron Sputtering
- Effects of He Gas Addition on the Production of Active Particles in rf Magnetron Sputtering
- Optimization of Contact Process with Monte Carlo Study for Advanced CMOS Devices
- Optimization of Contact Process with Monte-Carlo Study for Advanced CMOS Devices
- Polarization Dependence of Electric Field Intensity Distributions in Photoresist Films
- Preparation of As-Deposited 80 K-Phase Bi-Sr-Ca-Cu-O Films by RF Mgnetron Sputtering
- Monolayer Halftone Phase-Shifting Mask for KrF Excimer Laser Lithography