SUMI Hirofumi | MOS Process Department, Semiconductor Company, Sony Corp.

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概要

• 同名の論文著者
• MOS Process Department, Semiconductor Company, Sony Corp.の論文著者

関連著者

• SUMI Hirofumi

  MOS Process Department, Semiconductor Company, Sony Corp.

• KISHIDA Satoru

  Department of Electronics, Faculty of Engineering, Tottori University

• TOKUTAKA Heizo

  Department of Electronics, Faculty of Engineering, Tottori University

• Kishida S

  Opto-electronics Research Laboratories Nec Corporation

• Suenaga Jun

  Mos Process Dept. Mos Lsi Div. Semiconductor Company Sony Corporation

• Kishida Satoru

  Department Of Electrical And Electronic Engineering Faculty Of Engineering Tottori University

• Tokutaka Heizo

  Department Of Electrical And Electronic Engineering Faculty Of Engineering Tottori University

• ITO Naohiko

  Department of Molecular and Laboratory Medicine, Mie University Graduate School of Medicine

• Ito Naohiko

  Department Of Electrical And Electronic Engineering Tottori University

• Masuya Haruko

  Center For Materials Analysis Research Center Sony Corp.

• Tajima Kazuhiro

  Mos Process Dept. Mos Lsi Div. Semiconductor Company Sony Corporation

• Taguchi Mitsuru

  Mos Process Department Semiconductor Company Sony Corp.

• INOUE Hajime

  MOS Process Department, Semiconductor Company, Sony Corp.

• SUGANO Yukiyasu

  MOS Process Department, Semiconductor Company, Sony Corp.

• Sumi Hirofumi

  Mos Process Dept. Mos Lsi Div. Semiconductor Company Sony Corporation

• HORIUCHI Atsushi

  MOS Process dept., MOS LSI div., Semiconductor Company, Sony Corporation

• KANNO Michihiro

  MOS Process dept., MOS LSI div., Semiconductor Company, Sony Corporation

• OKAMOTO Yutaka

  MOS Process dept., MOS LSI div., Semiconductor Company, Sony Corporation

• Kanno Michihiro

  Mos Process Dept. Mos Lsi Div. Semiconductor Company Sony Corporation

• Horiuchi Atsushi

  Mos Process Dept. Mos Lsi Div. Semiconductor Company Sony Corporation

• Okamoto Yutaka

  Mos Process Dept. Mos Lsi Div. Semiconductor Company Sony Corporation

• MASUYA Haruko

  Center for Materials Analysis, Research Center, Sony Corp.

• TAGUCHI Mitsuru

  MOS Process Department, Semiconductor Company, Sony Corp.

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著作論文

• Characteristics of TiN Films Sputtered under Optimized Conditions of Metallic Mode Deposition
• Advanced Ti Salicide Technology for High Performance Quarter-Micron Logic LSIs

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