The Study of Ultrathin Tantalum Oxide Films before and after Annealing with X-Ray Photoelectron Spectroscopy

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1994-05-15

著者

• Yano F

  Semiconductor & Integrated Circuits Division Hitachi Limited

• Yano Fumiko

  Central Research Laboratory Hitachi Limited

• MUTO Akiko

  Central Research Laboratory, Hitachi Ltd

• Muto Akiko

  Central Research Laboratory Hitachi Ltd.

• SUGAWARA Yasuhiro

  Central Research Laboratory, Hitachi Ltd.

• IIJIMA Shimpei

  Central Research Laboratory, Hitachi Ltd.

• Iijima Shimpei

  Central Research Laboratory Hitachi Ltd.

• Muto Akiko

  Central Research Laboratory Hitachi Ltd

• Sugawara Yasuhiro

  Central Research Laboratory Hitachi Ltd.

関連論文

• Estimation of the Thickness of Ultrathin Silicon Nitride Films by X-Ray Photoelectron Spectroscopy
• The Study of Ultrathin Tantalum Oxide Films before and after Annealing with X-Ray Photoelectron Spectroscopy
• Quantitative Analysis of Trace Water in Monosilane Gas Using Atmospheric-Pressure Ionization Mass Spectrometer with Bicompartment Ion Source
• A New Atmospheric Pressure Ionization Mass Spectrometer for the Analysis of Trace Gas Impurities in Silicon Source Gases used for Semiconductor Fabrication
• IrO_2/Pb(Zr_xTi_)O_3(PZT)/Pt Ferroelectric Thin-Film Capacitors Resistant to Hydrogen-Annealing Damage
• Time-resolved acquisition technique for spatially-resolved electron energy-loss spectroscopy by energy-filtering TEM
• Time-resolved acquisition technique for elemental mapping by energy-filtering TEM
• Current Status and Future Trend of Analytical Instruments for Failure Analyses in Si Process
• X-Ray Photoelectron Spectroscopy Study of Native Oxidation on Misoriented Si(100)

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