High Rate Deposition of Silicon Dioxide Membrane by Excimer Laser Enhanced Projection Chemical Vapor Deposition from Organic Compounds at Low Temperature

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1993-06-30

著者

• Nishizawa Jun-ichi

  Semiconductor Research Institute, Semiconductor Research Foundation

• Nishizawa J

  Telecommunications Advancement Organization Of Japan Sendai Jpn

• Nishizawa Jun-ichi

  Telecommunications Advncement Organization Of Japan Sendai Research Center

• MINAMI Kazuyuki

  Department of Radiology, Fujita Health University

• Nishizawa Jun-ichi

  Semiconductor Research Foundation Semiconductor Research Institute

• Minami Kazuyuki

  Department Of Mechatronics And Treciesion Engineering Tohoku University

• Minami Kazuyuki

  Department Of Mechanical Engineering Yamaguchi University

• TOMOURA Seiichirou

  Engineering Administration, Asahi Chemical Industry Co., Ltd.

• TAKASHIMA Kouji

  Ishikawajima-Harima Heavy Industries Co., Ltd.

• ESASHI Masaki

  Department of Mechatronics and Treciesion Engineering, Tohoku University

• Esashi Masaki

  Department Of Mechatronics And Treciesion Engineering Tohoku University

• Takashima K

  Ishikawajima‐harima Heavy Ind. Co. Ltd.

• Tomoura Seiichirou

  Engineering Administration Asahi Chemical Industry Co. Ltd.

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