5. プラズマエッチングと電子エネルギー分布関数 (<小特集>電子エネルギー分布関数とプラズマプロセス)

概要

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UHF (500 MHz) plasma creates a high electron density simultaneously with a low degree of dissociation of the feed gas because the electron energy distribution function is not Maxwellian (bi-Maxwellian distributions). A high ion density and a high-energy tail in the electron energy distribution can also be maintained over a wide range of pressures (from 3 to 20 mTorr), whereas in conventional RF plasma (ICP: 13.56 MHz), the ion density and number of high-energy electrons are drastically reduced when the gas pressure is increased. This indicates that the ionization in the UHF plasma does not depend significantly on gas pressures between 3 and 20 mTorr because the discharge frequency is higher than the frequency of electron collisions in the plasma. As a result, UHF plasma provides a process window for high-performance etching that is wider than the one provided by RF plasma.
社団法人プラズマ・核融合学会の論文
2001-07-25