The Multi Arrayed Micro-scale Electron Optical System for Electron Beam Lithography using MEMS Technology
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概要
- 論文の詳細を見る
This paper presents a electron-beam lithography with 3 x 3 arrayed micro-scale electron optical system to achieve high throughput using MEMS(Micro-Electro-Mechanical Systems) technology. Electron beam lithography is a strong candidate for NGL(next generation lithography) technology. However, throughput of the electron beam lithography is a serious problem. The concept of the arrayed micro-scale electron optical system to improve throughput was introduced. But, because of a large number of components, the system has also several problems that wiring between the components is complicated and the integration of each module is very difficult. This paper presents a 3 x 3 multiple arrayed micro scale electron optical system and its fabrication process using double metallization process. The double metallization process is newly introduced interconnection method for reduced wiring among the components. For realized the arrayed microcolumn system, the multi arrayed field emission tip, the multi arrayed deflector introduced double metallization process and arrayed einzel lens were fabricated using novel anodic bonding process and deep silicon etching process. Finally, We assembled each components using anodic bonding technique. Moreover, A difference of signal delay between pad site and each deflector poles caused by multi interconnection structure was calculated using the SPICE simulator with equivalent circuit model. The calculation results were obtained about 3ns signal delay difference. Therefore, in these arrayed system, this method is very useful for check the signal delay difference.
- 社団法人電子情報通信学会の論文
- 2002-06-26
著者
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KIM Hak
Department of Radiation Oncology, Seoul National University College of Medicine
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Chun Kukjin
School Of Electrical Engineering And Computer Science #038 And Inter-university Semiconductor Resear
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CHUN Kukjin
Department of Electronics Engineering and Inter-University Semiconductor Research Center, Seoul Nati
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Kim Hak
School Of Electrical Engineering And Computer Science #038 And Inter-university Semiconductor Resear
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HAN Changho
Department of Electrical Engineering and Computer Science(#038) and Inter-university Semiconductor R
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LEE Kiyong
Department of Electrical Engineering and Computer Science(#038) and Inter-university Semiconductor R
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SEO Hyeongwoo
Department of Electrical Engineering and Computer Science(#038) and Inter-university Semiconductor R
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Han Changho
School Of Electrical Engineering And Computer Science #038 And Inter-university Semiconductor Resear
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Seo Hyeongwoo
Department Of Electrical Engineering And Computer Science(#038) And Inter-university Semiconductor R
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Lee Kywro
Department Of Electrical Engineering And Computer Science(#038) And Inter-university Semiconductor R
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Kim Hak
Department Of Electrical Engineering And Computer Science(#038) And Inter-university Semiconductor R
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Chun Kukjin
Department Of Electrical Engineering And Computer Science(#038) And Inter-university Semiconductor R
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